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Modeling, simulations, and optimizations of gallium oxide on gallium-nitride Schottky barrier diodes |
Tao Fang(房涛)1, Ling-Qi Li(李灵琪)1, Guang-Rui Xia(夏光睿)1,2,†, and Hong-Yu Yu(于洪宇)1,‡ |
1 School of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, China; 2 Department of Materials Engineering, the University of British Columbia, Vancouver, British Columbia, V6T1Z4, Canada |
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Abstract With technology computer-aided design (TCAD) simulation software, we design a new structure of gallium oxide on gallium-nitride Schottky barrier diode (SBD). The parameters of gallium oxide are defined as new material parameters in the material library, and the SBD turn-on and breakdown behavior are simulated. The simulation results reveal that this new structure has a larger turn-on current than Ga2O3 SBD and a larger breakdown voltage than GaN SBD. Also, to solve the lattice mismatch problem in the real epitaxy, we add a ZnO layer as a transition layer. The simulations show that the device still has good properties after adding this layer.
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Received: 14 July 2020
Revised: 21 September 2020
Accepted manuscript online: 14 October 2020
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PACS:
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73.40.Kp
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(III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions)
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64.70.kg
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(Semiconductors)
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61.72.uj
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(III-V and II-VI semiconductors)
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85.30.-z
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(Semiconductor devices)
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Corresponding Authors:
†Corresponding author. E-mail: gxia@mail.ubc.ca ‡Corresponding author. E-mail: yuhy@sustech.edu.cn
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Cite this article:
Tao Fang(房涛), Ling-Qi Li(李灵琪), Guang-Rui Xia(夏光睿), and Hong-Yu Yu(于洪宇) Modeling, simulations, and optimizations of gallium oxide on gallium-nitride Schottky barrier diodes 2021 Chin. Phys. B 30 027301
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