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Chin. Phys. B, 2022, Vol. 31(3): 037801    DOI: 10.1088/1674-1056/ac1eff
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Prev   Next  

High-pressure Raman study of osmium and rhenium up to 200 GPa and pressure dependent elastic shear modulus C44

Jingyi Liu(刘静仪), Yu Tao(陶雨), Chunmei Fan(范春梅), Binbin Wu(吴彬彬), Qiqi Tang(唐琦琪), and Li Lei(雷力)
Institute of Atomic and Molecular Physics, Sichuan University, Chengdu 610065, China
Abstract  High-pressure Raman scattering from hexagonal close-packed (HCP) metals Os and Re have been extended up to 200 GPa, and the pressure-dependent shear modulus C44 has been deduced from the Raman-active mode E2g, which is generated from the adjacent vibration of atoms in hexagonal planes, providing the valuable information about the elastic properties for HCP metals under high pressure. Combined with the available data of HCP metals from previous works, a further study indicates that the $C_{44}^\prime/C_{44}$ ratio would be close to a constant value, 0.01, with increasing atomic number of metals. The results obtained from high-pressure Raman scattering will allow us to probe the elastic anisotropy of the HCP metals at very high pressure.
Keywords:  hexagonal close-packed (HCP) metals      osmium      rhenium      high-pressure Raman scattering      shear modulus C44  
Received:  11 June 2021      Revised:  23 July 2021      Accepted manuscript online:  19 August 2021
PACS:  78.30.Er (Solid metals and alloys ?)  
  62.20.de (Elastic moduli)  
  81.40.Vw (Pressure treatment)  
Fund: We thank Prof. Filippo for helpful discussions. This work was financially supported by the National Natural Science Foundation of China (Grant Nos. 11774247 and U2030107) and Sichuan University Innovation Research Program of China (Grant No. 2020SCUNL107).
Corresponding Authors:  Li Lei     E-mail:  lei@scu.edu.cn

Cite this article: 

Jingyi Liu(刘静仪), Yu Tao(陶雨), Chunmei Fan(范春梅), Binbin Wu(吴彬彬), Qiqi Tang(唐琦琪), and Li Lei(雷力) High-pressure Raman study of osmium and rhenium up to 200 GPa and pressure dependent elastic shear modulus C44 2022 Chin. Phys. B 31 037801

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