Please wait a minute...
Chin. Phys. B, 2019, Vol. 28(9): 095201    DOI: 10.1088/1674-1056/ab344b
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Prev   Next  

Fluctuation of arc plasma in arc plasma torch with multiple cathodes

Zelong Zhang(张泽龙), Cheng Wang(王城), Qiang Sun(孙强), Weidong Xia(夏维东)
Department of Thermal Science and Energy Engineering, University of Science and Technology, Hefei 230027, China
Abstract  

Fluctuation phenomena commonly exist in arc plasmas, limiting the application of this technology. In this paper, we report an investigation of fluctuations of arc plasmas in an arc plasma torch with multiple cathodes. Time-resolved images of the plasma column and anode arc roots are captured. Variations of the arc voltage, plasma column diameter, and pressure are also revealed. The results indicate that two well-separated fluctuations exist in the arc plasma torch. One is the high-frequency fluctuation (of several thousand Hz), which arises from transferring of the anode arc root. The other is the low-frequency fluctuation (of several hundred Hz), which may come from the pressure variation in the arc plasma torch. Initial analysis reveals that as the gas flow rate changes, the low-frequency fluctuation shows a similar variation trend with the Helmholtz oscillation. This oscillation leads to the shrinking and expanding of the plasma column. As a result, the arc voltage shows a sinusoidal fluctuation.

Keywords:  arc fluctuation      arc plasma      Helmholtz oscillation      anode arc root      multiple cathodes  
Received:  13 June 2019      Revised:  09 July 2019      Accepted manuscript online: 
PACS:  52.25.Gj (Fluctuation and chaos phenomena)  
  52.80.Mg (Arcs; sparks; lightning; atmospheric electricity)  
  52.70.Kz (Optical (ultraviolet, visible, infrared) measurements)  
Fund: 

Project supported by the National Natural Science Foundation of China (Grant Nos. 11875256, 11675177, and 11705202) and Anhui Provincial Natural Science Foundation, China (Grant No. 1808085MA12).

Corresponding Authors:  Cheng Wang, Weidong Xia     E-mail:  awcheng@mail.ustc.edu.cn;xiawd@ustc.edu.cn

Cite this article: 

Zelong Zhang(张泽龙), Cheng Wang(王城), Qiang Sun(孙强), Weidong Xia(夏维东) Fluctuation of arc plasma in arc plasma torch with multiple cathodes 2019 Chin. Phys. B 28 095201

[1] Mougenot J, Gonzalez J, Freton P and Masquére M 2013 J. Phys. D:Appl. Phys. 46 135206
[2] Nemchinsky V A and Severance W 2006 J. Phys. D:Appl. Phys. 39 R423
[3] Bao S C, Guo W K, Ye M Y, Xu P and Zhang X D 2008 Plasma Sci. Technol. 10 701
[4] Xianliang J, Gitzhofer F and Boulos M 2006 Plasma Sci. Technol. 8 164
[5] Pan W, Li G, Meng X, Ma W and Wu C 2005 Pure Appl. Chem. 77 373
[6] Churilov G 2008 Fuller. Nanotub. Car. N 16 395
[7] Coudert J F and Rat V 2010 Surf. Coat. Technol. 205 949
[8] Bisson J and Moreau C 2003 J. Therm. Spray Technol. 12 258
[9] Bisson J, Gauthier B and Moreau C 2003 J. Therm. Spray Technol. 12 38
[10] Eckert E, Pfender E and Wutzke S 1967 AIAA J. 5 707
[11] Duan Z and Heberlein J 2002 J. Therm. Spray Technol. 11 44
[12] Nogues E, Fauchais P, Vardelle M and Granger P 2007 J. Therm. Spray Technol. 16 919
[13] Trelles J, Pfender E and Heberlein J 2007 J. Phys. D:Appl. Phys. 40 5635
[14] Zhao W, Tian K, Tang H, Liu D and Zhang G 2002 J. Phys. D:Appl. Phys. 35 2815
[15] Rat V, Mavier F and Coudert J F 2017 Plasma Chem. Plasma Process. 37 549
[16] Wu C and Pan W 2011 Theo. Appl. Mec. Lett. 1 024001
[17] Goyal V, Ravi G, Bandyopadhyay P, Banerjee S, Yugesh V and Mukherjee S 2017 Phys. Plasmas 24 033506
[18] Wang C, Zhang Z, Xia W, Cui H and Xia W 2017 Plasma Chem. Plasma Process. 37 371
[19] Coudert J F, Rat V and Rigot D 2007 J. Phys. D:Appl. Phys. 40 7357
[20] Coudert J F and Rat V 2008 J. Phys. D:Appl. Phys. 41 205208
[21] Huang H, Pan W, Guo Z and Wu C 2010 J. Phys. D:Appl. Phys. 43 085202
[22] Rat V and Coudert J F 2010 J. Appl. Phys. 108 043304
[23] Wang C, Cui H, Zhang Z, Xia W and Xia W 2017 Contrib. Plasma Phys. 57 58
[24] Wang C, Cui H C, Li W W, Liao M R, Xia W L and Xia W D 2017 Chin. Phys. B 26 025202
[25] Cao J W, Huang H J and Pan W X 2014 Chin. Phys. Lett. 31 115202
[26] Huang H, Pan W and Wu C 2012 Plasma Chem. Plasma Process 32 65
[1] Influence of low ambient pressure on the performance of a high-energy array surface arc plasma actuator
Bing-Liang Tang(唐冰亮), Shan-Guang Guo(郭善广), Hua Liang(梁华)†, and Meng-Xiao Tang(唐孟潇). Chin. Phys. B, 2020, 29(10): 105204.
[2] Characteristics of non-thermal AC arcs in multi-arc generator
Qifu Lin(林启富), Yanjun Zhao(赵彦君), Wenxue Duan(段文学), Guohua Ni(倪国华), Xinyue Jin(靳兴月), Siyuan Sui(隋思源), Hongbing Xie(谢洪兵), Yuedong Meng(孟月东). Chin. Phys. B, 2019, 28(12): 125205.
[3] Characteristics of helium DC plasma jets at atmospheric pressure with multiple cathodes
Cheng Wang(王城), Zelong Zhang(张泽龙), Haichao Cui(崔海超), Weiluo Xia(夏维珞), Weidong Xia(夏维东). Chin. Phys. B, 2017, 26(8): 085207.
[4] Production of a large area diffuse arc plasma with multiple cathode
Cheng Wang(王城), Hai-Chao Cui(崔海超), Wan-Wan Li(李皖皖), Meng-Ran Liao(廖梦然), Wei-Luo Xia(夏维珞), Wei-Dong Xia(夏维东). Chin. Phys. B, 2017, 26(2): 025202.
[5] Growth of small diameter multi-walled carbon nanotubes by arc discharge process
K. T. Chaudhary, J. Ali, P. P. Yupapin. Chin. Phys. B, 2014, 23(3): 035203.
[6] Absorption characteristic of arc plasma in the infrared region
Chen Yun-Yun(陈云云),Song Yang(宋旸), Li Zhen-Hua(李振华),and He An-Zhi(贺安之). Chin. Phys. B, 2011, 20(3): 034201.
[7] OES study of the gas phase during diamond films deposition in high power DC arc plasma jet CVD system
Zhou Zu-Yuan (周祖源), Chen Guang-Chao (陈广超), Tang Wei-Zhong (唐伟忠), Lü Fan-Xiu (吕反修). Chin. Phys. B, 2006, 15(5): 980-984.
[8] Plasma diffusion and transport in a magnetic duct filter
Zhang Tao (张涛), Liu Zhi-Guo (刘志国), Zhang Yi-Cong (张一聪), P. K. Chu (朱箭豪). Chin. Phys. B, 2002, 11(9): 963-966.
[9] THE INFLUENCE OF ELECTRON OSCILLATION ON PLASMA TRANSPORT THROUGH A MAGNETIC DUCT
Zhang Tao (张涛), T. K. Kwok (郭达勤), P. K. Chu (朱剑豪), I. G. Brown. Chin. Phys. B, 2001, 10(4): 320-323.
No Suggested Reading articles found!