中国物理B ›› 2015, Vol. 24 ›› Issue (7): 77306-077306.doi: 10.1088/1674-1056/24/7/077306

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

Modulation of WNx/Ge Schottky barrier height by varying N composition of tungsten nitride

魏江镔a, 池晓伟a, 陆超a, 王尘a, 林光杨a, 吴焕达a, 黄巍a, 李成a, 陈松岩a, 刘春莉b   

  1. a Department of Physics, Semiconductor Photonics Research Center, Xiamen University, Xiamen 361005, China;
    b Department of Physics, Hankuk University of Foreign Studies, Yongin 449-791, Korea
  • 收稿日期:2014-12-22 修回日期:2015-02-02 出版日期:2015-07-05 发布日期:2015-07-05
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 61176092 and 61474094), the National Basic Research Program of China (Grant Nos. 2012CB933503 and 2012CB632103), and the National Natural Science Foundation of China-National Research Foundation of Korea Joint Research Project (Grant No. 11311140251).

Modulation of WNx/Ge Schottky barrier height by varying N composition of tungsten nitride

Wei Jiang-Bin (魏江镔)a, Chi Xiao-Wei (池晓伟)a, Lu Chao (陆超)a, Wang Chen (王尘)a, Lin Guang-Yang (林光杨)a, Wu Huan-Da (吴焕达)a, Huang Wei (黄巍)a, Li Cheng (李成)a, Chen Song-Yan (陈松岩)a, Liu Chun-Li (刘春莉)b   

  1. a Department of Physics, Semiconductor Photonics Research Center, Xiamen University, Xiamen 361005, China;
    b Department of Physics, Hankuk University of Foreign Studies, Yongin 449-791, Korea
  • Received:2014-12-22 Revised:2015-02-02 Online:2015-07-05 Published:2015-07-05
  • Contact: Huang Wei, Li Cheng E-mail:weihuang@xmu.edu.cn;lich@xmu.edu.cn
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 61176092 and 61474094), the National Basic Research Program of China (Grant Nos. 2012CB933503 and 2012CB632103), and the National Natural Science Foundation of China-National Research Foundation of Korea Joint Research Project (Grant No. 11311140251).

摘要: Modulation of the Schottky barrier heights was successfully demonstrated for WNx/p-Ge and WNx/n-Ge contacts by increasing the nitrogen component in the WNx films. The WN0.38/p-Ge contact exhibits rectifying characteristic and an apparent Schottky barrier of 0.49 eV while the WN0.38/n-Ge Schottky contact exhibits quasi-Ohmic current–voltage characteristics. Dipoles formed at the contact interface by the difference of the Pauling electronegativities of Ge and N are confirmed to alleviate the Fermi-level pinning effect.

关键词: germanium, Fermi-level pinning, Schottky barrier height modulation, tungsten nitride

Abstract: Modulation of the Schottky barrier heights was successfully demonstrated for WNx/p-Ge and WNx/n-Ge contacts by increasing the nitrogen component in the WNx films. The WN0.38/p-Ge contact exhibits rectifying characteristic and an apparent Schottky barrier of 0.49 eV while the WN0.38/n-Ge Schottky contact exhibits quasi-Ohmic current–voltage characteristics. Dipoles formed at the contact interface by the difference of the Pauling electronegativities of Ge and N are confirmed to alleviate the Fermi-level pinning effect.

Key words: germanium, Fermi-level pinning, Schottky barrier height modulation, tungsten nitride

中图分类号:  (Metal-semiconductor-metal structures)

  • 73.40.Sx
73.40.Ei (Rectification) 73.61.At (Metal and metallic alloys)