›› 2014, Vol. 23 ›› Issue (12): 124215-124215.doi: 10.1088/1674-1056/23/12/124215

• ELECTROMAGNETISM, OPTICS, ACOUSTICS, HEAT TRANSFER, CLASSICAL MECHANICS, AND FLUID DYNAMICS • 上一篇    下一篇

A quantum efficiency analytical model for complementary metal–oxide–semiconductor image pixels with a pinned photodiode structure

曹琛, 张冰, 吴龙胜, 李娜, 王俊峰   

  1. Xi'an Microelectronics Technology Institute, Xi'an 710071, China
  • 收稿日期:2014-05-18 修回日期:2014-06-24 出版日期:2014-12-15 发布日期:2014-12-15
  • 基金资助:
    Project supported by the National Defense Pre-Research Foundation of China (Grant No. 51311050301095).

A quantum efficiency analytical model for complementary metal–oxide–semiconductor image pixels with a pinned photodiode structure

Cao Chen (曹琛), Zhang Bing (张冰), Wu Long-Sheng (吴龙胜), Li Na (李娜), Wang Jun-Feng (王俊峰)   

  1. Xi'an Microelectronics Technology Institute, Xi'an 710071, China
  • Received:2014-05-18 Revised:2014-06-24 Online:2014-12-15 Published:2014-12-15
  • Contact: Cao Chen E-mail:intercaochen@163.com
  • Supported by:
    Project supported by the National Defense Pre-Research Foundation of China (Grant No. 51311050301095).

摘要: A quantum efficiency analytical model for complementary metal–oxide–semiconductor (CMOS) image pixels with a pinned photodiode structure is developed. The proposed model takes account of the non-uniform doping distribution in the N-type region due to the impurity compensation formed by the actual fabricating process. The characteristics of two boundary PN junctions located in the N-type region for the particular spectral response of a pinned photodiode, are quantitatively analyzed. By solving the minority carrier steady-state diffusion equations and the barrier region photocurrent density equations successively, the analytical relationship between the quantum efficiency and the corresponding parameters such as incident wavelength, N-type width, peak doping concentration, and impurity density gradient of the N-type region is established. The validity of the model is verified by the measurement results with a test chip of 160× 160 pixels array, which provides the accurate process with a theoretical guidance for quantum efficiency design in pinned photodiode pixels.

关键词: CMOS image sensor, quantum efficiency, pinned photodiode, analytical model

Abstract: A quantum efficiency analytical model for complementary metal–oxide–semiconductor (CMOS) image pixels with a pinned photodiode structure is developed. The proposed model takes account of the non-uniform doping distribution in the N-type region due to the impurity compensation formed by the actual fabricating process. The characteristics of two boundary PN junctions located in the N-type region for the particular spectral response of a pinned photodiode, are quantitatively analyzed. By solving the minority carrier steady-state diffusion equations and the barrier region photocurrent density equations successively, the analytical relationship between the quantum efficiency and the corresponding parameters such as incident wavelength, N-type width, peak doping concentration, and impurity density gradient of the N-type region is established. The validity of the model is verified by the measurement results with a test chip of 160× 160 pixels array, which provides the accurate process with a theoretical guidance for quantum efficiency design in pinned photodiode pixels.

Key words: CMOS image sensor, quantum efficiency, pinned photodiode, analytical model

中图分类号:  (Imaging detectors and sensors)

  • 42.79.Pw
85.30.-z (Semiconductor devices) 78.40.Fy (Semiconductors)