| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
Prev
Next
|
|
|
Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target |
| Liu Cheng-Sen(刘成森)a)†, Han Hong-Ying(韩宏颖)a), Peng Xiao-Qing(彭晓晴)a), Chang Ye(昶叶)a), and Wang De-Zhen(王德真)b) |
| a College of Physics and Electronic Technology, Liaoning Normal University, Dalian 116029, China; b State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116023, China |
|
|
|
|
Abstract A two-dimensional particle-in-cell simulation is used to study the time-dependent evolution of the sheath surrounding a prolate spheroid target during a high voltage pulse in plasma source ion implantation. Our study shows that the potential contour lines pack more closely in the plasma sheath near the vertex of the major axis, i.e. where a thinner sheath is formed, and a non-uniform total ion dose distribution is incident along the surface of the prolate spheroid target due to the focusing of ions by the potential structure. Ion focusing takes place not only at the vertex of the major axis, where dense potential contour lines exist, but also at the vertex of the minor axis, where sparse contour lines exist. This results in two peaks of the received ion dose, locating at the vertices of the major and minor axes of the prolate spheroid target, and an ion dose valley, staying always between the vertices, rather than at the vertex of the minor axis.
|
Received: 03 July 2009
Revised: 13 August 2009
Accepted manuscript online:
|
|
PACS:
|
52.65.Rr
|
(Particle-in-cell method)
|
| |
52.40.Kh
|
(Plasma sheaths)
|
| |
52.77.Dq
|
(Plasma-based ion implantation and deposition)
|
|
| Fund: Project supported by the Program
for Innovative Research Team of High Education in Liaoning Province,
China (Grant No. 2009T055). |
Cite this article:
Liu Cheng-Sen(刘成森), Han Hong-Ying(韩宏颖), Peng Xiao-Qing(彭晓晴), Chang Ye(昶叶), and Wang De-Zhen(王德真) Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target 2010 Chin. Phys. B 19 035201
|
| [1] |
Conrad J R, Radtke J L, Dodd R A, Worzala F J and Tran N C 1987 J. Appl. Phys. 62 4591
|
| [2] |
Scheridan T E and Alport M J 1994 Appl. Phys. Lett. 64 1783
|
| [3] |
Mantese J V, Brown I G, Cheung N W and Collins G A 1996 MRSBull. 21 52
|
| [4] |
Chu P K, Qin S, Chan C, Cheung N W and Larson L A 1996 Mater.Sci. Eng. R 17 207
|
| [5] |
Kwok D T K, Chu P K and Chan C 1998 IEEE Trans. Plasma Sci. 26 1669
|
| [6] |
Tian X B, Fu R K Y, Chu P K and Yang S Q 2005 Surf. CoatingsTechnol. 196 162
|
| [7] |
Shao J, Jones E C and Cheung N W 1997 Surf. Coat. Technol. 93 254
|
| [8] |
Ayers R A, Simske S J, Bateman T A, Petkus A, Sachdeva R L C andGyunter V E 1999 J. Biomed. Mater. Res. 45 42
|
| [9] |
Ikeda D, Ogawa M, Hara Y, Nishimura Y, Odusanya O, Azuma K, MatsudaS, Yatsuzuka M and Murakami A 2002 Surf. Coat. Technol. 156 301
|
| [10] |
Chu P K, Chen J Y, Wang L P and Huang N 2002 Mater. Sci. Eng.:Rep. 36 143
|
| [11] |
Liu X, Chu P K and Ding C 2004 Mater. Sci. Eng.: Rep. 47 49
|
| [12] |
Wang S Y, Chu P K, Tang B Y, Zeng X C and Wang X F 1997 Nucl.Instrum. Methods Phys. Res. B 127 100
|
| [13] |
Sheridan T E 1993 J. Appl. Phys. 74 4903
|
| [14] |
Zeng X C, Tang B Y and Chu P K 1996 Appl. Phys. Lett. 69 3815
|
| [15] |
Zeng X C, Kwok T K, Liu A G, Chu P K and Tang B Y 1998 J. Appl.Phys. 83 44
|
| [16] |
Liu C S and Wang D Z 2003 Acta Phys. Sin. 52 109 (inChinese)
|
| [17] |
Zeng Z M, Kwok T K, Tian X B, Tang B Y and Chu P K 1999 J. Appl. Phys. 86 120
|
| [18] |
Liu C S and Wang D Z 2003 Surf. Coat. Technol. 171 119
|
| [19] |
Liu C S, Wang Y H and Wang D Z 2005 Chin. Phys. 14 163
|
| [20] |
Knapp D G 2002 Proc. SPIE 4832 394
|
| [21] |
Sun J X, Sun Q, Li D X and Lu Z W 2003 Acta Phys. Sin. 56 3900 (in Chinese)
|
| [22] |
Liu C S, Wang D Z, Liu T W and Wang Y H 2008 Acta Phys. Sin. 57 6450 (in Chinese)
|
| No Suggested Reading articles found! |
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
Altmetric
|
|
blogs
Facebook pages
Wikipedia page
Google+ users
|
Online attention
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.
View more on Altmetrics
|
|
|
