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Tensile stress regulated microstructures and ferroelectric properties of Hf
0.5
Zr
0.5
O
2
films
Siying Huo(霍思颖), Junfeng Zheng(郑俊锋), Yuanyang Liu(刘远洋), Yushan Li(李育姗),Ruiqiang Tao(陶瑞强), Xubing Lu(陆旭兵), and Junming Liu(刘俊明)
Chin. Phys. B . 2023, (
12
): 127701 -127701 . DOI: 10.1088/1674-1056/acfb79