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Other articles related with "metal-induced dopant activation"：
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57304 |
Wei Huang(黄巍), Chao Lu(陆超), Jue Yu(余珏), Jiang-Bin Wei(魏江镔), Chao-Wen Chen(陈超文), Jian-Yuan Wang(汪建元), Jian-Fang Xu(徐剑芳), Chen Wang(王尘), Cheng Li(李成), Song-Yan Chen(陈松岩), Chun-Li Liu(刘春莉), Hong-Kai Lai(赖虹凯) |
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High-performance germanium n+/p junction by nickel-induced dopant activation of implanted phosphorus at low temperature |
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Chin. Phys. B
2016 Vol.25 (5): 57304-057304
[Abstract]
(691)
[HTML 1 KB]
[PDF 398 KB]
(365)
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