| ELECTROMAGNETISM, OPTICS, ACOUSTICS, HEAT TRANSFER, CLASSICAL MECHANICS, AND FLUID DYNAMICS |
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High-performance and fabrication friendly polarization demultiplexer |
| Huan Guan(关欢)1, Yang Liu(刘阳)1,2, and Zhiyong Li (李智勇)1,2,† |
1 State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;
2 College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100083, China |
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Abstract A compact and fabrication friendly polarization demultiplexer (P-DEMUX) is proposed and characterized to enable wavelength-division-multiplexing and polarization-division-multiplexing simultaneously. The proposed structure is composed of a polarization-selective microring resonator in ultrathin waveguide and two bus channels in the silicon nitride-silica-silicon horizontal slot waveguides. In the slot waveguide, the transverse electric (TE) mode propagates through the silicon layer, while the transverse magnetic (TM) mode is confined in the slot region. In the designed ultra-thin waveguide, the TM mode is cut-off. The effective indexes of the TE modes for ultrathin and slot waveguides have comparable values. Thanks for these distinguishing features, the input TE mode can be efficiently filtered through the ultra-thin microring at the resonant wavelength, while the TM mode can directly output from the through port. Simulation results show that the extinction ratio of the proposed P-DEMUX for TE and TM modes are 33.21 dB and 24.97 dB, and the insertion losses are 0.346 dB and 0.324 dB, respectively, at the wavelength of 1551.64 nm. Furthermore, the device shows a broad bandwidth ($>100$ nm) for an extinction ratio (ER) of $>20$ dB. In addition, the proposed P-DEMUX also has a good fabrication tolerance for the waveguide width variation of $-20$ nm$\le \Delta w_{\rm g}\le 20$ nm and the microring width variation of $-20$ nm$\le \Delta w_{\rm r}\le $20 nm for a low insertion loss of $<0.75$ dB and low ER of $<-18$ dB.
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Received: 14 May 2021
Revised: 23 August 2021
Accepted manuscript online: 27 August 2021
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PACS:
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42.25.Ja
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(Polarization)
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42.79.-e
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(Optical elements, devices, and systems)
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42.79.Sz
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(Optical communication systems, multiplexers, and demultiplexers?)
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42.82.-m
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(Integrated optics)
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| Fund: Project is supported by the National Natural Science Foundation of China (Grant No. 61804148) and the National Key Research and Development Program of China (Grant No. 2018YFB2200202). |
Corresponding Authors:
Zhiyong Li
E-mail: lizhy@semi.ac.cn
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Cite this article:
Huan Guan(关欢), Yang Liu(刘阳), and Zhiyong Li (李智勇) High-performance and fabrication friendly polarization demultiplexer 2022 Chin. Phys. B 31 034203
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