Surface properties of diamond-like carbon films prepared by CVD and PVD methods
Liu Dong-Ping (刘东平)a, Liu Yan-Hong (刘艳红)b, Chen Bao-Xiang (陈宝祥)a
a Department of Mathematics and Physics, Dalian Nationality University, Dalian 116600, China; b State Key Laboratory for Material Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China
Abstract Diamond-like carbon (DLC) films have been deposited using three different techniques: (a) electron cyclotron resonance---plasma source ion implantation, (b) low-pressure dielectric barrier discharge, (c) filtered---pulsed cathodic arc discharge. The surface and mechanical properties of these films are compared using atomic force microscope-based tests. The experimental results show that hydrogenated DLC films are covered with soft surface layers enriched with hydrogen and sp hybridized carbon while the soft surface layers of tetrahedral amorphous carbon (ta-C) films have graphite-like structure. The formation of soft surface layers can be associated with the surface diffusion and growth induced by the low-energy deposition process. For typical CVD methods, the atomic hydrogen in the plasmas can contribute to the formation of hydrogen and sp hybridized carbon enriched surface layers. The high-energy ion implantation causes the rearrangement of atoms beneath the surface layer and leads to an increase in film density. The ta-C films can be deposited using the medium energy carbon ions in the highly-ionized plasma.
Fund: Project supported by National Natural Science Foundation of China (Grant No 10405005).
Cite this article:
Liu Dong-Ping (刘东平), Liu Yan-Hong (刘艳红), Chen Bao-Xiang (陈宝祥) Surface properties of diamond-like carbon films prepared by CVD and PVD methods 2006 Chinese Physics 15 575
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