Abstract Dielectric barrier discharge is used to study the mechanism of XeI excimer formation in the mixture of Xe and I2 at low pressures (<1330 Pa). Fluorescence emission in the spectral region of 200－260 nm is examined. We report on the characteristics of the 253 nm emission intensity which varied with different total pressure. The results indicate that under the present experimental conditions, electron impact is the major reaction producing the excimer XeI(B), interpreted as Xe++I2-→XeI(B)+ I*, then radiating 253 nm fluorescence from transition B→X. The 253 nm emission increases with the total gas pressure up to a maximum value at a pressure of about 540 Pa, then decreases as the gas pressure is further increased. The 206 nm emission is determined by I* from ionic recombination between Xe+ and I2-. This result differs from previous works under other experimental conditions.
Received: 04 July 2001
Revised: 27 January 2002
Accepted manuscript online:
(Potential energy surfaces for chemical reactions)
Fund: Project supported by the National Natural Science Foundation of Hebei Province, China (Grant No 197059).
Cite this article:
Zhang Lian-Shui (张连水), Zhao Xiao-Hui (赵晓辉), Han Li (韩理) Formation of the XeI excimer sustained by dielectric barrier discharge in Xe/I2 at low pressure 2002 Chinese Physics 11 568
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