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Chin. Phys. B, 2008, Vol. 17(4): 1231-1236    DOI: 10.1088/1674-1056/17/4/014
ATOMIC AND MOLECULAR PHYSICS Prev   Next  

Photodetachment of H-- in an electric field between two parallel interfaces

Wang De-Hua(王德华) and Yu Yong-Jiang(于永江)
College of Physics and Electronic Engineering, Ludong University, Yantai 264025, China
Abstract  By using the closed orbit theory, the photodetachment cross section of H- in a static electric field between two parallel elastic interfaces is derived and calculated. It is found that the photodetachment cross section depends on the electric field and the distance between the ion and the elastic interface. The oscillation of the cross section becomes more complicated than in the case of H- near one elastic interface. The results show that near the detachment threshold, the influence of the additional interface can be neglected. But with the increase of the energy, its influence becomes great. At some energies, the cross sections display sharp peaks, contrasting with the staircase structure when only one interface exists. This study provides a new understanding of the photodetachment process of H- in the presence of external field and interfaces.
Keywords:  closed-orbit theory      photodetachment cross section  
Received:  17 July 2007      Revised:  22 October 2007      Accepted manuscript online: 
PACS:  34.35.+a (Interactions of atoms and molecules with surfaces)  
  34.50.Fa (Electronic excitation and ionization of atoms (including beam-foil excitation and ionization))  
Fund: Project supported by the National Natural Science Foundation of China (Grant No 10604045).

Cite this article: 

Wang De-Hua(王德华) and Yu Yong-Jiang(于永江) Photodetachment of H-- in an electric field between two parallel interfaces 2008 Chin. Phys. B 17 1231

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