中国物理B ›› 2022, Vol. 31 ›› Issue (5): 58505-058505.doi: 10.1088/1674-1056/ac2b1f

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Current oscillation in GaN-HEMTs with p-GaN islands buried layer for terahertz applications

Wen-Lu Yang(杨文璐), Lin-An Yang(杨林安), Fei-Xiang Shen(申飞翔), Hao Zou(邹浩),Yang Li(李杨), Xiao-Hua Ma(马晓华), and Yue Hao(郝跃)   

  1. State Key Discipline Laboratory of Wide Band-gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071, China
  • 收稿日期:2021-06-29 修回日期:2021-09-25 出版日期:2022-05-14 发布日期:2022-04-21
  • 通讯作者: Lin-An Yang,E-mail:layang@xidian.edu.cn E-mail:layang@xidian.edu.cn
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos.61974108 and 61674117),the National Natural Science Foundation for Young Scholars of China (Grants No.61804119),and the Postdoctoral Science Foundation of China (Grants No.2018M643576).

Current oscillation in GaN-HEMTs with p-GaN islands buried layer for terahertz applications

Wen-Lu Yang(杨文璐), Lin-An Yang(杨林安), Fei-Xiang Shen(申飞翔), Hao Zou(邹浩),Yang Li(李杨), Xiao-Hua Ma(马晓华), and Yue Hao(郝跃)   

  1. State Key Discipline Laboratory of Wide Band-gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071, China
  • Received:2021-06-29 Revised:2021-09-25 Online:2022-05-14 Published:2022-04-21
  • Contact: Lin-An Yang,E-mail:layang@xidian.edu.cn E-mail:layang@xidian.edu.cn
  • About author:2021-9-29
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos.61974108 and 61674117),the National Natural Science Foundation for Young Scholars of China (Grants No.61804119),and the Postdoctoral Science Foundation of China (Grants No.2018M643576).

摘要: A GaN-based high electron mobility transistor (HEMT) with p-GaN islands buried layer (PIBL) for terahertz applications is proposed. The introduction of a p-GaN island redistributes the electric field in the gate-drain channel region, thereby promoting the formation of electronic domains in the two-dimensional electron gas (2DEG) channel. The formation and regulation mechanism of the electronic domains in the device are investigated using Silvaco-TCAD software. Simulation results show that the 0.2 μ m gate HEMT with a PIBL structure having a p-GaN island doping concentration (Np) of 2.5×1018 cm-3-3×1018 cm-3 can generate stable oscillations up to 344 GHz-400 GHz under the gate-source voltage (Vgs) of 0.6 V. As the distance (Dp) between the p-GaN island and the heterojunction interface increases from 5 nm to 15 nm, the fundamental frequency decreases from 377 GHz to 344 GHz, as well as the ratio of oscillation current amplitude of the fundamental component to the average component If1/Iavg ranging from 2.4% to 3.84%.

关键词: p-GaN island, high electron mobility transistor (HEMT), AlGaN/GaN, electron domain

Abstract: A GaN-based high electron mobility transistor (HEMT) with p-GaN islands buried layer (PIBL) for terahertz applications is proposed. The introduction of a p-GaN island redistributes the electric field in the gate-drain channel region, thereby promoting the formation of electronic domains in the two-dimensional electron gas (2DEG) channel. The formation and regulation mechanism of the electronic domains in the device are investigated using Silvaco-TCAD software. Simulation results show that the 0.2 μ m gate HEMT with a PIBL structure having a p-GaN island doping concentration (Np) of 2.5×1018 cm-3-3×1018 cm-3 can generate stable oscillations up to 344 GHz-400 GHz under the gate-source voltage (Vgs) of 0.6 V. As the distance (Dp) between the p-GaN island and the heterojunction interface increases from 5 nm to 15 nm, the fundamental frequency decreases from 377 GHz to 344 GHz, as well as the ratio of oscillation current amplitude of the fundamental component to the average component If1/Iavg ranging from 2.4% to 3.84%.

Key words: p-GaN island, high electron mobility transistor (HEMT), AlGaN/GaN, electron domain

中图分类号:  (Junction breakdown and tunneling devices (including resonance tunneling devices))

  • 85.30.Mn
05.10.Ln (Monte Carlo methods) 61.72.uj (III-V and II-VI semiconductors) 52.70.Gw (Radio-frequency and microwave measurements)