中国物理B ›› 2007, Vol. 16 ›› Issue (5): 1445-1449.doi: 10.1088/1009-1963/16/5/046

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Degradation characteristics and mechanism of PMOSFETs under NBT--PBT--NBT stress

刘红侠, 李忠贺, 郝跃   

  1. Key Lab of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, \\School of Microelectronics, Xidian University, Xi'an 710071, China
  • 收稿日期:2006-09-20 修回日期:2006-10-18 出版日期:2007-05-20 发布日期:2007-05-20
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No 60206006), the Program for New Century Excellent Talents of Ministry of Education of China (Grant No 681231366), the National Defense Pre-Research Foundation of China (Grant N

Degradation characteristics and mechanism of PMOSFETs under NBT--PBT--NBT stress

Liu Hong-Xia(刘红侠)†, Li Zhong-He(李忠贺), and Hao Yue(郝跃)   

  1. Key Lab of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China
  • Received:2006-09-20 Revised:2006-10-18 Online:2007-05-20 Published:2007-05-20
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No 60206006), the Program for New Century Excellent Talents of Ministry of Education of China (Grant No 681231366), the National Defense Pre-Research Foundation of China (Grant N

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摘要： Degradation characteristics of PMOSFETs under negative bias temperature--positive bias temperature--negative bias temperature (NBT--PBT--NBT) stress conditions are investigated in this paper. It is found that for all device parameters, the threshold voltage has the largest shift under the first NBT stress condition. When the polarity of gate voltage is changed to positive, the shift of device parameters can be greatly recovered. However, this recovery is unstable. The more severe degradation appears soon after reapplication of NBT stress condition. The second NBT stress causes in linear drain current to degrade greatly, which is different from that of the first NBT stress. This more severe parameter shift results from the wear out of silicon substrate and oxide interface during the first NBT and PBT stress due to carrier trapping/detrapping and hydrogen related species diffusion.

关键词: ultra deep submicron PMOSFETs, negative bias temperature instability (NBTI), positive bias temperature instability (PBTI), interface traps

Abstract: Degradation characteristics of PMOSFETs under negative bias temperature--positive bias temperature--negative bias temperature (NBT--PBT--NBT) stress conditions are investigated in this paper. It is found that for all device parameters, the threshold voltage has the largest shift under the first NBT stress condition. When the polarity of gate voltage is changed to positive, the shift of device parameters can be greatly recovered. However, this recovery is unstable. The more severe degradation appears soon after reapplication of NBT stress condition. The second NBT stress causes in linear drain current to degrade greatly, which is different from that of the first NBT stress. This more severe parameter shift results from the wear out of silicon substrate and oxide interface during the first NBT and PBT stress due to carrier trapping/detrapping and hydrogen related species diffusion.

Key words: ultra deep submicron PMOSFETs, negative bias temperature instability (NBTI), positive bias temperature instability (PBTI), interface traps

中图分类号:  (Semiconductor-device characterization, design, and modeling)

  • 85.30.De
85.30.Tv (Field effect devices)