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Formation of ZnGa2O4 films by multilayer deposition and subsequent thermal annealing* |
1. 2. School of Physics and Optoelectronic Engineering
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Abstract The Ga2O3/ZnO multilayer films are deposited on quartz substrates by magnetron sputtering, the thickness of Ga2O3 layer is varied in the range of 19-2.5nm and the thickness of ZnO layer is a constant of 1nm. Formation of spinel ZnGa2O4 films has been achieved via annealing of the Ga2O3/ZnO multilayer films. The influence of original Ga2O3 sublayer thickness on the optical and structural properties of Ga2O3/ZnO multilayer films and annealed films are studied. With a decrease in the thickness of Ga2O3 sublayers, Ga2O3/ZnO multilayer films show that the optical band-gap decreases, the intensity of the UV emission diminishes, the intensity of the violet emission is enhanced. The annealed films show that the optical band gap is enlarged, the violet emission is quenched, UV fluorescence band has been observed from Ga2O3 and ZnGa2O4.
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Received: 26 August 2013
Published: 31 October 2013
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Fund: the Planning Program of Leading Youth Scholars of Science and Technology of Yunnan Province of China |
Corresponding Authors:
Jin-Liang YAN
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Cite this article:
. Formation of ZnGa2O4 films by multilayer deposition and subsequent thermal annealing*. Chin. Phys. B, , (): 0.
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