中国物理B ›› 2019, Vol. 28 ›› Issue (6): 67302-067302.doi: 10.1088/1674-1056/28/6/067302
• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇 下一篇
Yan Liu(刘岩), Wei Chen(陈伟), Chaohui He(贺朝会), Chunlei Su(苏春垒), Chenhui Wang(王晨辉), Xiaoming Jin(金晓明), Junlin Li(李俊霖), Yuanyuan Xue(薛院院)
Yan Liu(刘岩)1,2, Wei Chen(陈伟)2, Chaohui He(贺朝会)1, Chunlei Su(苏春垒)2, Chenhui Wang(王晨辉)2, Xiaoming Jin(金晓明)2, Junlin Li(李俊霖)2, Yuanyuan Xue(薛院院)2
摘要:
Displacement damage induced by neutron irradiation in China Spallation Neutron Source (CSNS) is studied on bipolar transistors with lateral PNP, substrate PNP, and vertical NPN configurations, respectively. Comparison of the effects on different type transistors is conducted based on displacement damage factor, and the differences are analyzed through minority carrier lifetime calculation and structure analysis. The influence of CSNS neutrons irradiation on the lateral PNP transistors is analyzed by the gate-controlled method, including the oxide charge accumulation, surface recombine velocity, and minority carrier lifetime. The results indicate that the total ionizing dose in CSNS neutron radiation environment is negligible in this study. The displacement damage factors based on 1-MeV equivalent neutron flux of different transistors are consistent between Xi'an pulse reactor (XAPR) and CSNS.
中图分类号: (Other semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions)