中国物理B ›› 2009, Vol. 18 ›› Issue (9): 3995-3999.doi: 10.1088/1674-1056/18/9/063

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A novel structure of a high current gain 4H-SiC BJT with a buried layer in base

张有润, 张波, 李肇基, 邓小川, 刘曦麟   

  1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic[1.8mm] Science and Technology of China, Chengdu 610054, China
  • 收稿日期:2008-11-10 修回日期:2009-01-20 出版日期:2009-09-20 发布日期:2009-09-20

A novel structure of a high current gain 4H-SiC BJT with a buried layer in base

Zhang You-Run(张有润), Zhang Bo(张波), Li Zhao-Ji(李肇基), Deng Xiao-Chuan(邓小川), and Liu Xi-Ling(刘曦麟)   

  1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic[1.8mm] Science and Technology of China, Chengdu 610054, China
  • Received:2008-11-10 Revised:2009-01-20 Online:2009-09-20 Published:2009-09-20

摘要: In this paper, a new structure of a 4H-SiC bipolar junction transistor (BJT) with a buried layer (BL) in the base is presented. The current gain shows an approximately 100% increase compared with that of the conventional structure. This is attributed to the creation of a built-in electric field for the minority carriers to transport in the base which is explained based on 2D device simulations. The optimized design of the buried layer region is also considered by numeric simulations.

Abstract: In this paper, a new structure of a 4H-SiC bipolar junction transistor (BJT) with a buried layer (BL) in the base is presented. The current gain shows an approximately 100% increase compared with that of the conventional structure. This is attributed to the creation of a built-in electric field for the minority carriers to transport in the base which is explained based on 2D device simulations. The optimized design of the buried layer region is also considered by numeric simulations.

Key words: 4H-SiC, bipolar junction transistor (BJT), buried layer, current gain

中图分类号:  (Bipolar transistors)

  • 85.30.Pq
85.30.De (Semiconductor-device characterization, design, and modeling)