中国物理B ›› 2021, Vol. 30 ›› Issue (2): 27302-0.doi: 10.1088/1674-1056/abcf3e

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  • 收稿日期:2020-08-13 修回日期:2020-10-11 接受日期:2020-12-01 出版日期:2021-01-18 发布日期:2021-01-29

Novel fast-switching LIGBT with P-buried layer and partial SOI

Haoran Wang(王浩然), Baoxing Duan(段宝兴)†, Licheng Sun(孙李诚), and Yintang Yang(杨银堂)   

  1. Key Laboratory of the Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China
  • Received:2020-08-13 Revised:2020-10-11 Accepted:2020-12-01 Online:2021-01-18 Published:2021-01-29
  • Contact: Corresponding author. E-mail: bxduan@163.com
  • Supported by:
    Project supported by the National Basic Research Program of China (Grant No. 2015CB351906) and the Science Foundation for Distinguished Young Scholars of Shaanxi Province, China (Grant No. 2018JC-017).

Abstract: A novel silicon-on-insulator lateral insulated gate bipolar transistor (SOI LIGBT) is proposed in this paper. The proposed device has a P-type buried layer and a partial-SOI layer, which is called the BPSOI-LIGBT. Due to the electric field modulation effect generated by the P-type buried layer and the partial-SOI layer, the proposed structure generates two new peaks in the surface electric field distribution, which can achieve a smaller device size with a higher breakdown voltage. The smaller size of the device is beneficial to the fast switching. The simulation shows that under the same size, the breakdown voltage of the BPSOI LIGBT is 26% higher than that of the conventional partial-SOI LIGBT (PSOI LIGBT), and 84% higher than the traditional SOI LIGBT. When the forward voltage drop is 2.05 V, the turn-off time of the BPSOI LIGBT is 71% shorter than that of the traditional SOI LIGBT. Therefore, the proposed BPSOI LIGBT has a better forward voltage drop and turn-off time trade-off than the traditional SOI LIGBT. In addition, the BPSOI LIGBT effectively relieves the self-heating effect of the traditional SOI LIGBT.

Key words: P-type buried layer, breakdown voltage, electric field modulation, turn-off time

中图分类号:  (Semiconductor-insulator-semiconductor structures)

  • 73.40.Ty
85.30.De (Semiconductor-device characterization, design, and modeling) 85.30.Tv (Field effect devices)