中国物理B ›› 2019, Vol. 28 ›› Issue (7): 77402-077402.doi: 10.1088/1674-1056/28/7/077402

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

High quality NbTiN films fabrication and rapid thermal annealing investigation

Huan Ge(葛欢), Yi-Rong Jin(金贻荣), Xiao-Hui Song(宋小会)   

  1. 1 Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, University of Chinese Academy of Sciences, Beijing 100190, China;
    2 Beijing Academy of Quantum Information Sciences, Beijing 100193, China
  • 收稿日期:2019-01-28 修回日期:2019-05-16 出版日期:2019-07-05 发布日期:2019-07-05
  • 通讯作者: Xiao-Hui Song E-mail:xhsong@iphy.ac.cn
  • 基金资助:

    Project supported by the Chinese Academy of Sciences Strategic Priority Research Program B (Grant No. XDB07010300) and the National Natural Science Foundation of China (Grant No. 11674376).

High quality NbTiN films fabrication and rapid thermal annealing investigation

Huan Ge(葛欢)1, Yi-Rong Jin(金贻荣)1,2, Xiao-Hui Song(宋小会)1   

  1. 1 Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, University of Chinese Academy of Sciences, Beijing 100190, China;
    2 Beijing Academy of Quantum Information Sciences, Beijing 100193, China
  • Received:2019-01-28 Revised:2019-05-16 Online:2019-07-05 Published:2019-07-05
  • Contact: Xiao-Hui Song E-mail:xhsong@iphy.ac.cn
  • Supported by:

    Project supported by the Chinese Academy of Sciences Strategic Priority Research Program B (Grant No. XDB07010300) and the National Natural Science Foundation of China (Grant No. 11674376).

摘要:

NbTiN thin films are good candidates for applications including single-photon detector, kinetic inductance detector, hot electron bolometer, and superconducting quantum computing circuits because of their favorable characteristics, such as good superconducting properties and easy fabrication. In this work, we systematically investigated the growth of high-quality NbTiN films with different thicknesses on Si substrates by reactive DC-magnetron sputtering method. After optimizing the growth conditions, such as the gas pressure, Ar/N2 mixture ratio, and sputtering power, we obtained films with excellent superconducting properties. A high superconducting transition temperature of 15.5 K with narrow transition width of 0.03 K was obtained in a film of 300 nm thickness with surface roughness of less than 0.2 nm. In an ultra-thin film of 5 nm thick, we still obtained a transition temperature of 7.6 K. In addition, rapid thermal annealing (RTA) in atmosphere of nitrogen or nitrogen and hydrogen mixture was studied to improve the film quality. The results showed that Tc and crystal size of the NbTiN films were remarkably increased by RTA. For ultrathin films, the annealing in N2/H2 mixture had better effect than that in pure N2. The Tc of 10 nm films improved from 9.6 K to 10.3 K after RTA in N2/H2 mixture at 450℃.

关键词: superconducting transition temperature, surface roughness, NbTiN film, rapid thermal annealing

Abstract:

NbTiN thin films are good candidates for applications including single-photon detector, kinetic inductance detector, hot electron bolometer, and superconducting quantum computing circuits because of their favorable characteristics, such as good superconducting properties and easy fabrication. In this work, we systematically investigated the growth of high-quality NbTiN films with different thicknesses on Si substrates by reactive DC-magnetron sputtering method. After optimizing the growth conditions, such as the gas pressure, Ar/N2 mixture ratio, and sputtering power, we obtained films with excellent superconducting properties. A high superconducting transition temperature of 15.5 K with narrow transition width of 0.03 K was obtained in a film of 300 nm thickness with surface roughness of less than 0.2 nm. In an ultra-thin film of 5 nm thick, we still obtained a transition temperature of 7.6 K. In addition, rapid thermal annealing (RTA) in atmosphere of nitrogen or nitrogen and hydrogen mixture was studied to improve the film quality. The results showed that Tc and crystal size of the NbTiN films were remarkably increased by RTA. For ultrathin films, the annealing in N2/H2 mixture had better effect than that in pure N2. The Tc of 10 nm films improved from 9.6 K to 10.3 K after RTA in N2/H2 mixture at 450℃.

Key words: superconducting transition temperature, surface roughness, NbTiN film, rapid thermal annealing

中图分类号:  (Properties of superconductors)

  • 74.25.-q
74.25.F- (Transport properties) 74.78.-w (Superconducting films and low-dimensional structures)