中国物理B ›› 2016, Vol. 25 ›› Issue (4): 48104-048104.doi: 10.1088/1674-1056/25/4/048104
• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇 下一篇
Xiang He(何祥), Gang Wang(王刚), Heng Zhao(赵恒), Ping Ma(马平)
Xiang He(何祥), Gang Wang(王刚), Heng Zhao(赵恒), Ping Ma(马平)
摘要:
This paper mainly focuses on the influence of colloidal silica polishing on the damage performance of fused silica optics. In this paper, nanometer sized colloidal silica and micron sized ceria are used to polish fused silica optics. The colloidal silica polished samples and ceria polished samples exhibit that the root-mean-squared (RMS) average surface roughness values are 0.7 nm and 1.0 nm, respectively. The subsurface defects and damage performance of the polished optics are analyzed and discussed. It is revealed that colloidal silica polishing will introduce much fewer absorptive contaminant elements and subsurface damages especially no trailing indentation fracture. The 355-nm laser damage test reveals that each of the fused silica samples polished with colloidal silica has a much higher damage threshold and lower damage density than ceria polished samples. Colloidal silica polishing is potential in manufacturing high power laser optics.
中图分类号: (Pulsed laser ablation deposition)