Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by β-ray

doi:10.1088/1674-1056/28/2/024215

中国物理B ›› 2019, Vol. 28 ›› Issue (2): 24215-024215.doi: 10.1088/1674-1056/28/2/024215

• ELECTROMAGNETISM, OPTICS, ACOUSTICS, HEAT TRANSFER, CLASSICAL MECHANICS, AND FLUID DYNAMICS • 上一篇下一篇

Laser-induced damage threshold in HfO₂/SiO₂ multilayer films irradiated by β-ray

Mei-Hua Fang(方美华), Peng-Yu Tian(田鹏宇), Mao-Dong Zhu(朱茂东), Hong-Ji Qi(齐红基), Tao Fei(费涛), Jin-Peng Lv(吕金鹏), Hui-Ping Liu(刘会平)

1 College of Astronautics, Nanjing University of Aeronautics & Astronautics, Nanjing 210016, China;
2 Laboratory of Thin Film Optics, Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Machanics, Chinese Academy of Sciences, Shanghai 201800, China;
3 Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China

收稿日期:2018-09-03 修回日期:2018-09-27 出版日期:2019-02-05 发布日期:2019-02-05
通讯作者: Mei-Hua Fang E-mail:fmh_medphys@nuaa.edu.cn
基金资助:
Project supported by the National Natural Science Foundation of China (Grant No. 11405085) and the Jiangsu Provincial Natural Science Fund, China (Grant No. BK20130789).

Laser-induced damage threshold in HfO₂/SiO₂ multilayer films irradiated by β-ray

Mei-Hua Fang(方美华)¹, Peng-Yu Tian(田鹏宇)¹, Mao-Dong Zhu(朱茂东)², Hong-Ji Qi(齐红基)², Tao Fei(费涛)¹, Jin-Peng Lv(吕金鹏)¹, Hui-Ping Liu(刘会平)³

1 College of Astronautics, Nanjing University of Aeronautics & Astronautics, Nanjing 210016, China;
2 Laboratory of Thin Film Optics, Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Machanics, Chinese Academy of Sciences, Shanghai 201800, China;
3 Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China

Received:2018-09-03 Revised:2018-09-27 Online:2019-02-05 Published:2019-02-05
Contact: Mei-Hua Fang E-mail:fmh_medphys@nuaa.edu.cn
Supported by:
Project supported by the National Natural Science Foundation of China (Grant No. 11405085) and the Jiangsu Provincial Natural Science Fund, China (Grant No. BK20130789).

摘要/Abstract

摘要： Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO₂/SiO₂ multilayer films are prepared by e-beam evaporation and then β-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold (LIDT), which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm² to 12 J/cm², i.e., 50% increase, after the film has been irradiated by 2.2×10¹³/cm² β-ray, the particle irradiation can be used as a controllable and desirable post-processing method to improve the resistance to laser induced damage.

关键词: β-ray irradiation, HfO₂/SiO₂ multilayer film, residual stress, laser-induced damage threshold

Abstract: Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO₂/SiO₂ multilayer films are prepared by e-beam evaporation and then β-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold (LIDT), which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm² to 12 J/cm², i.e., 50% increase, after the film has been irradiated by 2.2×10¹³/cm² β-ray, the particle irradiation can be used as a controllable and desirable post-processing method to improve the resistance to laser induced damage.

Key words: β-ray irradiation, HfO₂/SiO₂ multilayer film, residual stress, laser-induced damage threshold

中图分类号: (Optical coatings)

42.79.Wc

46.70.Hg (Membranes, rods, and strings) 79.20.Eb (Laser ablation) 42.70.-a (Optical materials)

方美华, 田鹏宇, 朱茂东, 齐红基, 费涛, 吕金鹏, 刘会平. Laser-induced damage threshold in HfO₂/SiO₂ multilayer films irradiated by β-ray[J]. 中国物理B, 2019, 28(2): 24215-024215.

Mei-Hua Fang(方美华), Peng-Yu Tian(田鹏宇), Mao-Dong Zhu(朱茂东), Hong-Ji Qi(齐红基), Tao Fei(费涛), Jin-Peng Lv(吕金鹏), Hui-Ping Liu(刘会平). Laser-induced damage threshold in HfO₂/SiO₂ multilayer films irradiated by β-ray[J]. Chin. Phys. B, 2019, 28(2): 24215-024215.

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Laser-induced damage threshold in HfO₂/SiO₂ multilayer films irradiated by β-ray

Laser-induced damage threshold in HfO₂/SiO₂ multilayer films irradiated by β-ray

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