Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

doi:10.1088/1674-1056/26/11/118104

中国物理B ›› 2017, Vol. 26 ›› Issue (11): 118104-118104.doi: 10.1088/1674-1056/26/11/118104

• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇下一篇

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

Yuan Li(李源), Hongwei Yan(严鸿维), Ke Yang(杨科), Caizhen Yao(姚彩珍), Zhiqiang Wang(王志强), Chunyan Yan(闫春燕), Xinshu Zou(邹鑫书), Xiaodong Yuan(袁晓东), Liming Yang(杨李茗), Xin Ju(巨新)

1. University of Science and Technology Beijing, Department of Physics, Beijing 100083, China;
2. China Academy of Engineering Physics, Laser Fusion Research Center, Mianyang 621900, China;
3. Fine Optical Engineering Research Center, Chengdu 610041, China

收稿日期:2017-05-13 修回日期:2017-07-21 出版日期:2017-11-05 发布日期:2017-11-05
基金资助:
Project supported by the China Postdoctoral Science Foundation (Grant No. 2016M592709) and the National Natural Science Foundation of China (Grant No. 51535003).

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

Yuan Li(李源)^1,2, Hongwei Yan(严鸿维)², Ke Yang(杨科)², Caizhen Yao(姚彩珍)², Zhiqiang Wang(王志强)², Chunyan Yan(闫春燕)¹, Xinshu Zou(邹鑫书)², Xiaodong Yuan(袁晓东)², Liming Yang(杨李茗)³, Xin Ju(巨新)¹

1. University of Science and Technology Beijing, Department of Physics, Beijing 100083, China;
2. China Academy of Engineering Physics, Laser Fusion Research Center, Mianyang 621900, China;
3. Fine Optical Engineering Research Center, Chengdu 610041, China

Received:2017-05-13 Revised:2017-07-21 Online:2017-11-05 Published:2017-11-05
Contact: Xin Ju E-mail:jux@ustb.edu.cn
Supported by:
Project supported by the China Postdoctoral Science Foundation (Grant No. 2016M592709) and the National Natural Science Foundation of China (Grant No. 51535003).

摘要/Abstract

摘要：

Polished fused silica samples were etched for different durations by using hydrofluoric (HF) acid solution with HF concentrations in an ultrasonic field. Surface and subsurface polishing residues and molecular structure parameters before and after the etching process were characterized by using a fluorescence microscope and infrared (IR) spectrometer, respectively. The laser induced damage thresholds (LIDTs) of the samples were measured by using pulsed nanosecond laser with wavelength of 355 nm. The results showed that surface and subsurface polishing residues can be effectively reduced by the acid etching process, and the LIDTs of fused silica are significantly improved. The etching effects increased with the increase of the HF concentration from 5 wt.% to 40 wt.%. The amount of polishing residues decreased with the increase of the etching duration and then kept stable. Simultaneously, with the increase of the etching time, the mechanical strength and molecular structure were improved.

关键词: HF etching, fused silica, laser induced damage threshold, infrared spectra

Abstract:

Key words: HF etching, fused silica, laser induced damage threshold, infrared spectra

中图分类号: (Surface cleaning, etching, patterning)

81.65.Cf

33.20.Ea (Infrared spectra) 42.70.Ce (Glasses, quartz)

李源, 严鸿维, 杨科, 姚彩珍, 王志强, 闫春燕, 邹鑫书, 袁晓东, 杨李茗, 巨新. Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching[J]. 中国物理B, 2017, 26(11): 118104-118104.

Yuan Li(李源), Hongwei Yan(严鸿维), Ke Yang(杨科), Caizhen Yao(姚彩珍), Zhiqiang Wang(王志强), Chunyan Yan(闫春燕), Xinshu Zou(邹鑫书), Xiaodong Yuan(袁晓东), Liming Yang(杨李茗), Xin Ju(巨新). Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching[J]. Chin. Phys. B, 2017, 26(11): 118104-118104.

参考文献 21

[1]	Salleo A, Taylor S T, Martin M C, Panero W R, Jeanloz R, Sands T and Génin F Y 2003 Nat. Mater. 2 796
[2]	Wong J, Ferriera J L, Lindsey E F, Haupt D L, Hutcheon I D and Kinney J H 2006 J. Non-Cryst. Solids 352 255
[3]	Papernov S and Schmid A W 2008 Proc. SPIE 7132 71321J
[4]	He X, Wang G, Zhao H and Ma P 2016 Chin. Phys. B 25 048104
[5]	Miller P E, Bude J D, Suratwala T I, Shen N, Laurence T A, Steele W A, Menapace J, Feit M D and Wong L L 2010 Opt. Lett. 35 2702
[6]	Ye H, Li Y, Zhang Q, Wang W, Yuan Z, Wang J and Xu Q 2016 Appl. Opt. 55 3017
[7]	Wang J, Li Y, Yuan Z, Ye H, Xie R, Chen X and Xu Q 2015 Proc. SPIE 9532 95320H
[8]	Battersby C L, Sheehan L M and Kozlowski M R 1999 Proc. SPIE 3578 456
[9]	Suratwala T I, Miller P E, Bude J D, Steele W A, Shen N, Monticelli M V, Feit M D, Laurence T A, Norton M A, Carr C W and Wong L L 2011 J. Am. Ceram. Soc. 94 416
[10]	Bude J, Miller P, Baxamusa S, Shen N, Laurence T, Steele W, Suratwala T, Wong L, Carr W, Cross D and Monticelli M 2014 Opt. Express 22 5839
[11]	Stuart B C, Feit M D, Herman S, Rubenchik A M, Shore B W and Perry M D 1996 Phys. Rev. B 53 1749
[12]	Hongjie L, Jin H, Fengrui W, Xinda Z, Xiaodong J, Weidong W and Wanguo Z 2014 Proc. SPIE 9255 92553V
[13]	Li C H, Ju X, Huang J, Zhou X D, Zheng Z, Jiang X D, Wu W D and Zheng W G 2011 Nucl. Instrum. Meth. B 269 544
[14]	Galeener F L 1979 Phys. Rev. B 19 4292
[15]	Lehmann A, Schumann L and Hubner K 1983 Phys. Status Solidi B 117 689
[16]	Tomozawa M, Hong J W and Ryu S R 2005 J. Non-Cryst. Solids 351 1054
[17]	Ishikawa K, Suzuki K and Okamura S 2000 J. Appl. Phys. 88 7150
[18]	Agarwal A and Tomozawa M 1997 J. Non-Cryst. Solids 209 166
[19]	Zhang C C, Zhang L J, Liao W, Yan Z H, Chen J, Jiang Y L, Wang H J, Luan X Y, Ye Y Y, Zheng W G and Yuan X D 2015 Chin. Phys. B 24 024220
[20]	Mozzi R L and Warren B E 1969 J. Appl. Crystallogr. 2 164
[21]	Uchino T, Takahashi M and Yoko T 2001 Phys. Rev. Lett. 86 1777

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

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