中国物理B ›› 2016, Vol. 25 ›› Issue (5): 58301-058301.doi: 10.1088/1674-1056/25/5/058301

• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇    下一篇

A nano-scale mirror-like surface of Ti-6Al-4V attained by chemical mechanical polishing

Chenliang Liang(梁晨亮), Weili Liu(刘卫丽), Shasha Li(李沙沙), Hui Kong(孔慧), Zefang Zhang(张泽芳), Zhitang Song(宋志棠)   

  1. 1. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;
    2. University of the Chinese Academy of Sciences, Beijing 100049, China
  • 收稿日期:2015-11-23 修回日期:2016-01-20 出版日期:2016-05-05 发布日期:2016-05-05
  • 通讯作者: Weili Liu E-mail:rabbitlwl@mail.sim.ac.cn
  • 基金资助:
    Project supported by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period of China (Grant No. 2009ZX02030-1), the National Natural Science Foundation of China (Grant No. 51205387), the Support by Science and Technology Commission of Shanghai City, China (Grant No. 11nm0500300), and the Science and Technology Commission of Shanghai City, China (Grant No. 14XD1425300).

A nano-scale mirror-like surface of Ti-6Al-4V attained by chemical mechanical polishing

Chenliang Liang(梁晨亮)1,2, Weili Liu(刘卫丽)1, Shasha Li(李沙沙)1,2, Hui Kong(孔慧)1,2, Zefang Zhang(张泽芳)1, Zhitang Song(宋志棠)1   

  1. 1. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;
    2. University of the Chinese Academy of Sciences, Beijing 100049, China
  • Received:2015-11-23 Revised:2016-01-20 Online:2016-05-05 Published:2016-05-05
  • Contact: Weili Liu E-mail:rabbitlwl@mail.sim.ac.cn
  • Supported by:
    Project supported by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period of China (Grant No. 2009ZX02030-1), the National Natural Science Foundation of China (Grant No. 51205387), the Support by Science and Technology Commission of Shanghai City, China (Grant No. 11nm0500300), and the Science and Technology Commission of Shanghai City, China (Grant No. 14XD1425300).

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摘要： Metal Ti and its alloys have been widely utilized in the fields of aviation, medical science, and micro-electro-mechanical systems, for its excellent specific strength, resistance to corrosion, and biological compatibility. As the application of Ti moves to the micro or nano scale, however, traditional methods of planarization have shown their short slabs. Thus, we introduce the method of chemical mechanical polishing (CMP) to provide a new way for the nano-scale planarization method of Ti alloys. We obtain a mirror-like surface, whose flatness is of nano-scale, via the CMP method. We test the basic mechanical behavior of Ti-6Al-4V (Ti64) in the CMP process, and optimize the composition of CMP slurry. Furthermore, the possible reactions that may take place in the CMP process have been studied by electrochemical methods combined with x-ray photoelectron spectroscopy (XPS). An equivalent circuit has been built to interpret the dynamic of oxidation. Finally, a model has been established to explain the synergy of chemical and mechanical effects in the CMP of Ti-6Al-4V.

关键词: chemical mechanical polishing, titanium, electrochemical, x-ray photoelectron spectroscopy (XPS)

Abstract: Metal Ti and its alloys have been widely utilized in the fields of aviation, medical science, and micro-electro-mechanical systems, for its excellent specific strength, resistance to corrosion, and biological compatibility. As the application of Ti moves to the micro or nano scale, however, traditional methods of planarization have shown their short slabs. Thus, we introduce the method of chemical mechanical polishing (CMP) to provide a new way for the nano-scale planarization method of Ti alloys. We obtain a mirror-like surface, whose flatness is of nano-scale, via the CMP method. We test the basic mechanical behavior of Ti-6Al-4V (Ti64) in the CMP process, and optimize the composition of CMP slurry. Furthermore, the possible reactions that may take place in the CMP process have been studied by electrochemical methods combined with x-ray photoelectron spectroscopy (XPS). An equivalent circuit has been built to interpret the dynamic of oxidation. Finally, a model has been established to explain the synergy of chemical and mechanical effects in the CMP of Ti-6Al-4V.

Key words: chemical mechanical polishing, titanium, electrochemical, x-ray photoelectron spectroscopy (XPS)

中图分类号:  (Extensional flow and combined shear and extension)

  • 83.50.Jf