中国物理B ›› 2017, Vol. 26 ›› Issue (10): 104210-104210.doi: 10.1088/1674-1056/26/10/104210

• ELECTROMAGNETISM, OPTICS, ACOUSTICS, HEAT TRANSFER, CLASSICAL MECHANICS, AND FLUID DYNAMICS • 上一篇    下一篇

Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation

Zhen Yu(余振), Hong-Ji Qi(齐红基), Wei-Li Zhang(张伟丽), Hu Wang(王虎), Bin Wang(王斌), Yue-Liang Wang(王岳亮), Hao-Peng Huang(黄昊鹏)   

  1. 1. Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Shanghai 201800, China;
    2. University of Chinese Academy of Sciences, Beijing 100049, China
  • 收稿日期:2017-03-10 修回日期:2017-05-12 出版日期:2017-10-05 发布日期:2017-10-05
  • 通讯作者: Hong-Ji Qi E-mail:qhj@siom.ac.cn

Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation

Zhen Yu(余振)1,2, Hong-Ji Qi(齐红基)1, Wei-Li Zhang(张伟丽)1, Hu Wang(王虎)1,2, Bin Wang(王斌)1,2, Yue-Liang Wang(王岳亮)1,2, Hao-Peng Huang(黄昊鹏)1,2   

  1. 1. Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Shanghai 201800, China;
    2. University of Chinese Academy of Sciences, Beijing 100049, China
  • Received:2017-03-10 Revised:2017-05-12 Online:2017-10-05 Published:2017-10-05
  • Contact: Hong-Ji Qi E-mail:qhj@siom.ac.cn

摘要: A systematic interpretation of laser-induced damage in the nanosecond regime is realized with a defect distribution buried inside the redeposited layer arising from a polishing process. Under the 355-nm laser irradiation, the size dependence of the defect embedded in the fused silica can be illustrated through the thermal conduction model. Considering CeO2 as the major initiator, the size distribution with the power law model is determined from the damage probability statistics. To verify the accuracy of the size distribution, the ion output scaling with depth for the inclusion element is obtained with the secondary ion mass spectrometer. For CeO2 particulates in size of the depth interval with ion output satisfied in the negative exponential form, the corresponding density is consistent with that of the identical size in the calculated size distribution. This coincidence implies an alternative method for the density analysis of photoactive imperfections within optical components at the semi-quantitative level based on the laser damage tests.

关键词: laser-induced damage, size distribution, photoactive imperfection

Abstract: A systematic interpretation of laser-induced damage in the nanosecond regime is realized with a defect distribution buried inside the redeposited layer arising from a polishing process. Under the 355-nm laser irradiation, the size dependence of the defect embedded in the fused silica can be illustrated through the thermal conduction model. Considering CeO2 as the major initiator, the size distribution with the power law model is determined from the damage probability statistics. To verify the accuracy of the size distribution, the ion output scaling with depth for the inclusion element is obtained with the secondary ion mass spectrometer. For CeO2 particulates in size of the depth interval with ion output satisfied in the negative exponential form, the corresponding density is consistent with that of the identical size in the calculated size distribution. This coincidence implies an alternative method for the density analysis of photoactive imperfections within optical components at the semi-quantitative level based on the laser damage tests.

Key words: laser-induced damage, size distribution, photoactive imperfection

中图分类号:  (Laser materials)

  • 42.70.Hj
68.55.Ln (Defects and impurities: doping, implantation, distribution, concentration, etc.) 78.20.nb (Photothermal effects)