中国物理B ›› 2005, Vol. 14 ›› Issue (7): 1428-1432.doi: 10.1088/1009-1963/14/7/028

• • 上一篇    下一篇

Pyrosol process for deposition of fluorine-doped tin dioxide thin films

曲艺1, 张馨1, 陈红1, 高锦岳1, 周大凡2   

  1. (1)College of Physics, Jilin University, Changchun 130023, China; (2)Institue of Changchun New-Century Nanotechnology , Changchun 130033, China
  • 收稿日期:2004-09-15 修回日期:2005-03-21 出版日期:2005-06-20 发布日期:2005-06-20

Pyrosol process for deposition of fluorine-doped tin dioxide thin films

Qu Yi (曲艺)a, Zhang Xin (张馨)a, Chen Hong (陈红)a, Gao Jin-Yue (高锦岳)a, Zhou Da-Fan (周大凡)b   

  1. a College of Physics, Jilin University, Changchun 130023, China; b Institue of Changchun New-Century Nanotechnology , Changchun 130033, China
  • Received:2004-09-15 Revised:2005-03-21 Online:2005-06-20 Published:2005-06-20

PDF (PC)

764

赞

摘要： Transparent low-resistance SnO$_{2}$:F films, suitable as a low-emissivity and conducting coating, have been deposited on silica-coated soda lime glass substrates by pyrosol process. SnCl$_{4}\cdot $5H$_{2}$O and NH$_{4}$F dissolved in solvent of 50{\%} C$_{2}$H$_{5}$OH/50{\%} H$_{2}$O served as the starting solution. With the parameters such as substrate temperature of 450${^\circ}$C, distance between the nozzle and substrate of 60mm, carrier gas flow rate of 8L/min and deposition time of 5min, the optimized SnO$_{2}$:F films having a sheet resistance of about 2$\Omega$/$\Box$, were deposited repeatedly. The relationship between sheet resistances and infrared transmission spectra of SnO$_{2}$:F films is shown schematically.

关键词: pyrosol deposition, tin dioxide, conducting coating

Abstract: Transparent low-resistance SnO$_{2}$:F films, suitable as a low-emissivity and conducting coating, have been deposited on silica-coated soda lime glass substrates by pyrosol process. SnCl$_{4}\cdot $5H$_{2}$O and NH$_{4}$F dissolved in solvent of 50% C$_{2}$H$_{5}$OH/50% H$_{2}$O served as the starting solution. With the parameters such as substrate temperature of 450${^\circ}$C, distance between the nozzle and substrate of 60mm, carrier gas flow rate of 8L/min and deposition time of 5min, the optimized SnO$_{2}$:F films having a sheet resistance of about 2$\Omega$/$\Box$, were deposited repeatedly. The relationship between sheet resistances and infrared transmission spectra of SnO$_{2}$:F films is shown schematically.

Key words: pyrosol deposition, tin dioxide, conducting coating

中图分类号:  (Insulators)

  • 73.61.Ng
68.55.A- (Nucleation and growth) 73.50.Gr (Charge carriers: generation, recombination, lifetime, trapping, mean free paths) 78.30.Hv (Other nonmetallic inorganics) 68.55.Ln (Defects and impurities: doping, implantation, distribution, concentration, etc.)