The effect of deposition temperature on the intermixing and microstructure of Fe/Ni thin film

doi:10.1088/1674-1056/19/12/126801

中国物理B ›› 2010, Vol. 19 ›› Issue (12): 126801-126801.doi: 10.1088/1674-1056/19/12/126801

The effect of deposition temperature on the intermixing and microstructure of Fe/Ni thin film

陈尚达, 王涛, 郑德立, 周益春

Faculty of Materials, Photoelectronics and Physics, Xiangtan University, Xiangtan 411105, China;Key Laboratory of Low-Dimensional Materials & Application Technology, Ministry of Education, Xiangtan 411105, China

收稿日期:2009-12-16 修回日期:2010-03-16 出版日期:2010-12-15 发布日期:2010-12-15
基金资助:
Project supported by the National Natural Science Foundation for Young Scientists of China (Grant No. 10702058) and the China Postdoctoral Science Foundation (Grant No. 20090451100).

The effect of deposition temperature on the intermixing and microstructure of Fe/Ni thin film

Chen Shang-Da(陈尚达)^a)b)^†, Wang Tao(王涛)^a)b), Zheng De-Li(郑德立)^a)b), and Zhou Yi-Chun(周益春)^a)b)

^aFaculty of Materials, Photoelectronics and Physics, Xiangtan University, Xiangtan 411105, China; ^b Key Laboratory of Low-Dimensional Materials & Application Technology, Ministry of Education, Xiangtan 411105, China

Received:2009-12-16 Revised:2010-03-16 Online:2010-12-15 Published:2010-12-15
Supported by:
Project supported by the National Natural Science Foundation for Young Scientists of China (Grant No. 10702058) and the China Postdoctoral Science Foundation (Grant No. 20090451100).

摘要/Abstract

摘要： The physical vapour deposition of Ni atoms on α-Fe(001) surface under different deposition temperatures were simulated by molecular dynamics to study the intermixing and microstructure of the interfacial region. The results indicate that Ni atoms hardly penetrate into Fe substrate while Fe atoms easily diffuse into Ni deposition layers. The thickness of the intermixing region is temperature-dependent, with high temperatures yielding larger thicknesses. The deposited layers are mainly composed of amorphous phase due to the abnormal deposition behaviour of Ni and Fe. In the deposited Ni-rich phase, the relatively stable metallic compound B₂ structured FeNi is found under high deposition temperature conditions.

Abstract: The physical vapour deposition of Ni atoms on $\alpha$-Fe(001) surface under different deposition temperatures were simulated by molecular dynamics to study the intermixing and microstructure of the interfacial region. The results indicate that Ni atoms hardly penetrate into Fe substrate while Fe atoms easily diffuse into Ni deposition layers. The thickness of the intermixing region is temperature-dependent, with high temperatures yielding larger thicknesses. The deposited layers are mainly composed of amorphous phase due to the abnormal deposition behaviour of Ni and Fe. In the deposited Ni-rich phase, the relatively stable metallic compound B₂ structured FeNi is found under high deposition temperature conditions.

Key words: molecular dynamics, physical vapour deposition, Ni/Fe thin film, temperature effect

中图分类号: (Thin film structure and morphology)

68.55.-a

81.15.Aa (Theory and models of film growth)

陈尚达, 王涛, 郑德立, 周益春. The effect of deposition temperature on the intermixing and microstructure of Fe/Ni thin film[J]. 中国物理B, 2010, 19(12): 126801-126801.

Chen Shang-Da(陈尚达), Wang Tao(王涛), Zheng De-Li(郑德立), and Zhou Yi-Chun(周益春). The effect of deposition temperature on the intermixing and microstructure of Fe/Ni thin film[J]. Chin. Phys. B, 2010, 19(12): 126801-126801.

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The effect of deposition temperature on the intermixing and microstructure of Fe/Ni thin film

The effect of deposition temperature on the intermixing and microstructure of Fe/Ni thin film

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