中国物理B ›› 2015, Vol. 24 ›› Issue (11): 117703-117703.doi: 10.1088/1674-1056/24/11/117703

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

Indium-tin oxide films obtained by DC magnetron sputtering for improved Si heterojunction solar cell applications

谷锦华, 司嘉乐, 王九秀, 冯亚阳, 郜小勇, 卢景霄   

  1. Key Laboratory of Materials Physics of Ministry of Education, School of Physical Engineering, Zhengzhou University, Zhengzhou 450052, China
  • 收稿日期:2014-11-28 修回日期:2015-05-18 出版日期:2015-11-05 发布日期:2015-11-05
  • 通讯作者: Gu Jin-Hua E-mail:gujinh@zzu.edu.cn
  • 基金资助:
    Project supported by the National High Technology Research and Development Program of China (Grant No. 2011AA050501).

Indium-tin oxide films obtained by DC magnetron sputtering for improved Si heterojunction solar cell applications

Gu Jin-Hua (谷锦华), Si Jia-Le (司嘉乐), Wang Jiu-Xiu (王九秀), Feng Ya-Yang (冯亚阳), Gao Xiao-Yong (郜小勇), Lu Jing-Xiao (卢景霄)   

  1. Key Laboratory of Materials Physics of Ministry of Education, School of Physical Engineering, Zhengzhou University, Zhengzhou 450052, China
  • Received:2014-11-28 Revised:2015-05-18 Online:2015-11-05 Published:2015-11-05
  • Contact: Gu Jin-Hua E-mail:gujinh@zzu.edu.cn
  • Supported by:
    Project supported by the National High Technology Research and Development Program of China (Grant No. 2011AA050501).

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摘要： The indium-tin oxide (ITO) film as the antireflection layer and front electrodes is of key importance to obtaining high efficiency Si heterojunction (HJ) solar cells. To obtain high transmittance and low resistivity ITO films by direct-current (DC) magnetron sputtering, we studied the impacts of the ITO film deposition conditions, such as the oxygen flow rate, pressure, and sputter power, on the electrical and optical properties of the ITO films. ITO films of resistivity of 4×10-4 Ω ·m and average transmittance of 89% in the wavelength range of 380-780 nm were obtained under the optimized conditions: oxygen flow rate of 0.1 sccm, pressure of 0.8 Pa, and sputtering power of 110 W. These ITO films were used to fabricate the single-side HJ solar cell without an intrinsic a-Si:H layer. However, the best HJ solar cell was fabricated with a lower sputtering power of 95 W, which had an efficiency of 11.47%, an open circuit voltage (Voc) of 0.626 V, a filling factor (FF) of 0.50, and a short circuit current density (Jsc) of 36.4 mA/cm2. The decrease in the performance of the solar cell fabricated with high sputtering power of 110 W is attributed to the ion bombardment to the emitter. The Voc was improved to 0.673 V when a 5 nm thick intrinsic a-Si:H layer was inserted between the (p) a-Si:H and (n) c-Si layer. The higher Voc of 0.673 V for the single-side HJ solar cell implies the excellent c-Si surface passivation by a-Si:H.

关键词: ITO films, Si heterojunction solar cell, DC magnetron sputtering

Abstract: The indium-tin oxide (ITO) film as the antireflection layer and front electrodes is of key importance to obtaining high efficiency Si heterojunction (HJ) solar cells. To obtain high transmittance and low resistivity ITO films by direct-current (DC) magnetron sputtering, we studied the impacts of the ITO film deposition conditions, such as the oxygen flow rate, pressure, and sputter power, on the electrical and optical properties of the ITO films. ITO films of resistivity of 4×10-4 Ω ·m and average transmittance of 89% in the wavelength range of 380-780 nm were obtained under the optimized conditions: oxygen flow rate of 0.1 sccm, pressure of 0.8 Pa, and sputtering power of 110 W. These ITO films were used to fabricate the single-side HJ solar cell without an intrinsic a-Si:H layer. However, the best HJ solar cell was fabricated with a lower sputtering power of 95 W, which had an efficiency of 11.47%, an open circuit voltage (Voc) of 0.626 V, a filling factor (FF) of 0.50, and a short circuit current density (Jsc) of 36.4 mA/cm2. The decrease in the performance of the solar cell fabricated with high sputtering power of 110 W is attributed to the ion bombardment to the emitter. The Voc was improved to 0.673 V when a 5 nm thick intrinsic a-Si:H layer was inserted between the (p) a-Si:H and (n) c-Si layer. The higher Voc of 0.673 V for the single-side HJ solar cell implies the excellent c-Si surface passivation by a-Si:H.

Key words: ITO films, Si heterojunction solar cell, DC magnetron sputtering

中图分类号:  (Elements, oxides, nitrides, borides, carbides, chalcogenides, etc.)

  • 77.84.Bw
81.15.Cd (Deposition by sputtering) 73.61.Jc (Amorphous semiconductors; glasses)