中国物理B ›› 2015, Vol. 24 ›› Issue (9): 97106-097106.doi: 10.1088/1674-1056/24/9/097106

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

Cubic ZnO films obtained at low pressure by molecular beam epitaxy

王小丹, 周华, 王惠琼, 任飞, 陈晓航, 詹华瀚, 周颖慧, 康俊勇   

  1. Key Laboratory of Semiconductors and Applications of Fujian Province, Department of Physics, Xiamen University, Xiamen 361005, China
  • 收稿日期:2015-03-30 修回日期:2015-06-03 出版日期:2015-09-05 发布日期:2015-09-05
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 11204253, U1232110, U1332105, 61227009, and 91321102), the Fundamental Research Funds for Central Universities, China (Grant No. 2013SH001), and the National High Technology Research and Development Program of China (Grant No. 2014AA052202).

Cubic ZnO films obtained at low pressure by molecular beam epitaxy

Wang Xiao-Dan (王小丹), Zhou Hua (周华), Wang Hui-Qiong (王惠琼), Ren Fei (任飞), Chen Xiao-Hang (陈晓航), Zhan Hua-Han (詹华瀚), Zhou Ying-Hui (周颖慧), Kang Jun-Yong (康俊勇)   

  1. Key Laboratory of Semiconductors and Applications of Fujian Province, Department of Physics, Xiamen University, Xiamen 361005, China
  • Received:2015-03-30 Revised:2015-06-03 Online:2015-09-05 Published:2015-09-05
  • Contact: Wang Hui-Qiong E-mail:hqwang@xmu.edu.cn
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 11204253, U1232110, U1332105, 61227009, and 91321102), the Fundamental Research Funds for Central Universities, China (Grant No. 2013SH001), and the National High Technology Research and Development Program of China (Grant No. 2014AA052202).

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摘要： A zinc oxide thin film in cubic crystalline phase, which is usually prepared under high pressure, has been grown on the MgO (001) substrate by a three-step growth using plasma-assisted molecular beam epitaxy. The cubic structure is confirmed by in-situ reflection high energy electron diffraction measurements and simulations. The x-ray photoelectron spectroscopy reveals that the outer-layer surface of the film (less than 5 nm thick) is of ZnO phase while the buffer layer above the substrate is of ZnMgO phase, which is further confirmed by the band edge transmissions at the wavelengths of about 390 nm and 280 nm, respectively. The x-ray diffraction exhibits no peaks related to wurtzite ZnO phase in the film. The cubic ZnO film is presumably considered to be of the rock-salt phase. This work suggests that the metastable cubic ZnO films, which are of applicational interest for p-type doping, can be epitaxially grown on the rock-salt substrates without the usually needed high pressure conditions.

关键词: ZnO film, rock-salt structure, molecular beam epitaxy, reflection high energy electron diffraction

Abstract: A zinc oxide thin film in cubic crystalline phase, which is usually prepared under high pressure, has been grown on the MgO (001) substrate by a three-step growth using plasma-assisted molecular beam epitaxy. The cubic structure is confirmed by in-situ reflection high energy electron diffraction measurements and simulations. The x-ray photoelectron spectroscopy reveals that the outer-layer surface of the film (less than 5 nm thick) is of ZnO phase while the buffer layer above the substrate is of ZnMgO phase, which is further confirmed by the band edge transmissions at the wavelengths of about 390 nm and 280 nm, respectively. The x-ray diffraction exhibits no peaks related to wurtzite ZnO phase in the film. The cubic ZnO film is presumably considered to be of the rock-salt phase. This work suggests that the metastable cubic ZnO films, which are of applicational interest for p-type doping, can be epitaxially grown on the rock-salt substrates without the usually needed high pressure conditions.

Key words: ZnO film, rock-salt structure, molecular beam epitaxy, reflection high energy electron diffraction

中图分类号:  (II-VI semiconductors)

  • 71.55.Gs
81.15.-z (Methods of deposition of films and coatings; film growth and epitaxy) 68.55.-a (Thin film structure and morphology) 61.05.jh (Low-energy electron diffraction (LEED) and reflection high-energy electron diffraction (RHEED))