中国物理B ›› 2007, Vol. 16 ›› Issue (7): 2044-2050.doi: 10.1088/1009-1963/16/7/040

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇    下一篇

RF electric field penetration and power deposition into nonequilibrium planar-type inductively coupled plasmas

毛明, 王帅, 戴忠玲, 王友年   

  1. The State Key Laboratory of Materials Modification, Department of Physics, Dalian University of Technology, Dalian 116024, China
  • 收稿日期:2006-09-13 修回日期:2007-01-23 出版日期:2007-07-04 发布日期:2007-07-04
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos 10376003 and 10572035).

RF electric field penetration and power deposition into nonequilibrium planar-type inductively coupled plasmas

Mao Ming(毛明), Wang Shuai(王帅), Dai Zhong-Ling(戴忠玲), and Wang You-Nian(王友年)   

  1. The State Key Laboratory of Materials Modification, Department of Physics, Dalian University of Technology, Dalian 116024, China
  • Received:2006-09-13 Revised:2007-01-23 Online:2007-07-04 Published:2007-07-04
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos 10376003 and 10572035).

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摘要： The RF electric field penetration and the power deposition into planar-type inductively coupled plasmas in low-pressure discharges have been studied by means of a self-consistent model which consists of Maxwell equations combined with the kinetic equation of electrons. The Maxwell equations are solved based on the expansion of the Fourier--Bessel series for determining the RF electric field. Numerical results show the influence of a non-Maxwellian electron energy distribution on the RF electric field penetration and the power deposition for different coil currents. Moreover, the two-dimensional spatial profiles of RF electric field and power density are also shown for different numbers of RF coil turns.

Abstract: The RF electric field penetration and the power deposition into planar-type inductively coupled plasmas in low-pressure discharges have been studied by means of a self-consistent model which consists of Maxwell equations combined with the kinetic equation of electrons. The Maxwell equations are solved based on the expansion of the Fourier--Bessel series for determining the RF electric field. Numerical results show the influence of a non-Maxwellian electron energy distribution on the RF electric field penetration and the power deposition for different coil currents. Moreover, the two-dimensional spatial profiles of RF electric field and power density are also shown for different numbers of RF coil turns.

Key words: inductively coupled plasma, RF field penetration, kinetic theory

中图分类号:  (Plasma sources)

  • 52.50.Dg
52.25.Dg (Plasma kinetic equations) 52.65.-y (Plasma simulation) 52.80.Yr (Discharges for spectral sources)