[1] Lu X P, Naidis G V, Laroussi M, Reuter S, Graves D B and Ostrikov K 2016 Phys. Rep. 630 1 [2] Zhao N, Wu K Y, Chen J Y, Jia P Y and Li X C 2021 Spectrosc. Spect. Anal. 41 2644 [3] Dou S, Tao L, Wang R L, Hankari S E, Chen R and Wang S Y 2018 Adv. Mater. 30 1705850 [4] Zhang Y T, Guo Y, Wang D W, Feng Y and Ma T C 2010 Chin. Phys. Lett. 27 068201 [5] Liu Y F, Han J M, Zhang G L, Wang J L, Li M, Yang W B, Liu C Z, Li H Q and Yang S Z 2004 Chin. Phys. Lett. 21 1314 [6] Wang R X, Zhang C, Liu X, Xie Q, Yan P and Tao S 2015 Appl. Surf. Sci. 328 509 [7] Wu J C, Wu K Y, Chen J Y, Song C H, Jia P Y and Li X C 2021 Plasma Sci. Technol. 23 085504 [8] Shi Y C, Li J J, Liu H, Zuo Y G, Bai Y, Sun Z F, Ma D L and Chen G C 2015 Chin. Phys. Lett. 32 088104 [9] Wu M, Uehara S, Wu J, Xiao Y C, Nakajima T and Sato T 2020 J. Phys. D 53 485201 [10] Li X C, Wang B, Jia P Y, Yang L W, Li Y R and Chu J D 2017 Plasma Sci. Technol. 19 115505 [11] Shao T, Wang R X, Zhang C and Yan P 2018 High Volt. 3 14 [12] Nicol M J, Brubaker T R, Honish B J, Simmons A N, Kazemi A, Geissel M A, Whalen C T, Siedlecki C A, Bilén S G, Knecht S D and Kirimanjeswara G S 2020 Sci. Rep. 10 3066 [13] Fan Z Q, Zhong J Y, Li Z W, Zheng Y C, Wang Z Z and Bai S P 2021 J. Phys. D 54 455204 [14] Zhang R, Yu J S, Huang J, Chen G L, Liu X, Chen W, Wang X Q and Li C R 2018 Chin. Phys. B 27 055207 [15] Ning W J, Dai D and Zhang Y H 2019 Appl. Phys. Lett. 114 054104 [16] Athanasopoulos D, Svarnas P, Ladas S, Kennou S and Koutsoukos P 2018 Appl. Phys. Lett. 112 213703 [17] Cheng C, Shen J, Xiao D Z, Xie H B, Lan Y, Fang S D, Meng Y D and Paul K C 2014 Chin. Phys. B 23 075204 [18] Walsh J L, Iza F, Janson N B, Law V J and Kong M G 2010 J. Phys. D 43 075201 [19] Teschke M, Kedzierski J, Finantu-Dinu E G, Korzec D and Engemann J 2005 IEEE Trans. Plasma Sci. 2 310 [20] Lu X P and Laroussi M 2006 J. Appl. Phys. 100 063302 [21] Li S Z, Huang W T, Zhang J L and Wang D Z 2009 Appl. Phys. Lett. 94 111501 [22] Pinchuk M E, Stepanova O M, Astafiev A M, Lazukin A V and Chen Z Q 2019 Appl. Phys. Lett. 114 194103 [23] Xiong Q, Lu X P, Ostrikov K, Xiong Z, Xian Y, Zhou F, Zou C, Hu J, Gong W and Jiang Z 2009 Phys. Plasmas 16 043505 [24] Lu X P, Naidis G V, Laroussi M and Ostrikov K 2014 Phys. Rep. 540 123 [25] Abdelaziz A A and Kim H H 2021 Plasma Process. Polym. 18 2000190 [26] Abdelaziz A A, Teramoto Y and Kim H H 2022 J. Phys. D 55 065201 [27] Li X C, Lin X T, Wu K Y, Jia P Y, Dong L F and Ran J X 2018 Plasma Process. Polym. 15 1700224 [28] Li X C, Lin X T, Wu K Y, Ren C H, Liu R and Jia P Y 2019 Plasma Sources Sci. Technol. 28 055006 [29] Li X C, Chen J Y, Lin X T, Wu J C, Wu K Y and Jia P Y 2020 Plasma Sources Sci. Technol. 29 065015 [30] Wu J C, Jia P Y, Ran J X, Chen J Y, Zhang F R, Wu K Y, Zhao N, Ren C H, Yin Z Q and Li X C 2021 Phys. Plasmas 28 073501 [31] Engeln R, Klarenaar B and Guaitella O 2020 Plasma Sources Sci. Technol. 29 063001 [32] Li X C, Chen J Y, Wu K Y, Wu J C, Zhang F R, Zhao N, Jia P Y, Yin Z Q, Wang Y J and Ren C H 2021 Phys. Plasmas 28 103507 [33] Zhao N, Wu K Y, He X R, Chen J Y, Tan X, Wu J C, Ran J X, Jia P Y and Li X C 2022 J. Phys. D 55 015203 [34] Brisset A, Gibson A R, Schröter S, Niemi K, Booth J, Gans T, O'Connell D and Wagenaars E 2021 J. Phys. D 54 285201 [35] Han X, Liu D X, Wang W T, Liu Z J, Guo L, Rong M Z and Kong M G 2018 Phys. Plasmas 25 113506 [36] Fang Z, Zhou Y D and Yao Z Q 2014 IEEE Trans. Plasma Sci. 42 2618 [37] Thiyagarajan M, Sarani A and Nicula C 2013 J. Appl. Phys. 113 233302 [38] Kimura T and Noto M 2006 J. Appl. Phys. 100 063303 [39] Li J, Lei B Y, Wang J, Xu B P, Ran S, Wang Y S, Zhang T Y, Tang J, Zhao W and Duan Y X 2021 Commun. Phys. 4 64 [40] Fang Z, Ruan C, Shao T and Zhang C 2016 Plasma Sources Sci. Technol. 25 01LT01 [41] Wang S, Schulz-von der Gathen V and Döbele H F 2003 Appl. Phys. Lett. 83 3272 [42] Moravej M, Yang X and Hicks R F 2006 J. Appl. Phys. 99 093305 [43] Lim J P and Uhm H S 2007 Phys. Plasmas 14 093504 [44] Kong D L, He F, Yang B Y, Duan Z C, Han R Y, Miao J S, Yan X and Ouyang J T 2021 J. Phys. D 54 405201 [45] Li X C, Jia P Y, Liu Z H, Li L C and Dong L F 2008 Acta Phys. Sin. 57 1001 (in Chinese) [46] Yang L J, Song C H, Zhao N, Zhou S, Wu J C and Jia P Y 2021 Acta Phys. Sin. 70 155201 (in Chinese) [47] Yuan Q H, Wang X M, Yin G Q, Li J and Dong C Z 2016 Contrib. Plasma Phys. 56 870 [48] Xiong Q, Nikiforov A Y, Lu X P and Leys C 2010 J. Phys. D 43 415201 [49] Zhu X M, Pu Y K, Balcon N and Boswell R 2009 J. Phys. D 42 142003 [50] Greb A, Niemi K, O'Connell D and Gans T 2014 Appl. Phys. Lett. 105 234105 [51] Wu J C, Wu K Y, Chen J Y, Song C H, Jia P Y and Li X C 2021 Plasma Sci. Technol. 23 085504 [52] Li X C, Yuan N, Jia P Y, Chang Y Y and Ji Y F 2011 Acta Phys. Sin. 60 125204 (in Chinese) [53] Jiang W M, Tang J, Wang Y S, Zhao W and Duan Y X 2014 Sci. Rep. 4 6323 [54] Li X C, Chang Y Y, Liu R F, Zhao H H and Di C 2013 Acta Phys. Sin. 62 165205 (in Chinese) [55] Starikovskiy A Y and Aleksandrov N L 2020 Plasma Sources Sci. Technol. 29 075004 [56] Raizer Y P 1991 Gas Discharge Physics (Berlin: Springer) [57] Li X C, Geng J L, Jia P Y, Wu K Y, Jia B Y and Kang P C 2018 Acta Phys. Sin. 67 075201 (in Chinese) [58] Jia P Y, Gao K, Zhou S, Chen J Y, Wu J C, Wu K Y and Li X C 2021 Plasma Sources Sci. Technol. 30 095021 [59] Zhang B Y, Wang Q, Zhang G X and Liao S S 2014 J. Appl. Phys. 115 043302 [60] Siefert N S, Sands B L and Ganguly B N 2006 Appl. Phys. Lett. 89 011502 [61] Han D M, Liu Y X, Gao F, Liu W Y, Xu J and Wang Y N 2018 Chin. Phys. B 27 065202 [62] Yuan X C, Li H W, Abbas M F, Li X R, Wang Z, Zhang G J and Sun A B 2020 J. Phys. D 53 425204 [63] Ponomarev A A and Aleksandrov N L 2015 Plasma Sources Sci. Technol. 24 035001 |