中国物理B ›› 2018, Vol. 27 ›› Issue (10): 105208-105208.doi: 10.1088/1674-1056/27/10/105208

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇    下一篇

Practical 2.45-GHz microwave-driven Cs-free H- ion source developed at Peking University

Tao Zhang(张滔), Shi-Xiang Peng(彭士香), Wen-Bin Wu(武文斌), Hai-Tao Ren(任海涛), Jing-Feng Zhang(张景丰), Jia-Mei Wen(温佳美), Teng-Hao Ma(马腾昊), Yao-Xiang Jiang(蒋耀湘), Jiang Sun(孙江), Zhi-Yu Guo(郭之虞), Jia-Er Chen(陈佳洱)   

  1. SKLNPT & IHIP, School of Physics, Peking University, Beijing 100871, China
  • 收稿日期:2018-03-06 修回日期:2018-06-08 出版日期:2018-10-05 发布日期:2018-10-05
  • 通讯作者: Shi-Xiang Peng E-mail:sxpeng@pku.edu.cn
  • 基金资助:

    Project supported by the National Natural Science Foundation of China (Grant Nos. 11775007 and 11575013).

Practical 2.45-GHz microwave-driven Cs-free H- ion source developed at Peking University

Tao Zhang(张滔), Shi-Xiang Peng(彭士香), Wen-Bin Wu(武文斌), Hai-Tao Ren(任海涛), Jing-Feng Zhang(张景丰), Jia-Mei Wen(温佳美), Teng-Hao Ma(马腾昊), Yao-Xiang Jiang(蒋耀湘), Jiang Sun(孙江), Zhi-Yu Guo(郭之虞), Jia-Er Chen(陈佳洱)   

  1. SKLNPT & IHIP, School of Physics, Peking University, Beijing 100871, China
  • Received:2018-03-06 Revised:2018-06-08 Online:2018-10-05 Published:2018-10-05
  • Contact: Shi-Xiang Peng E-mail:sxpeng@pku.edu.cn
  • Supported by:

    Project supported by the National Natural Science Foundation of China (Grant Nos. 11775007 and 11575013).

摘要:

A practical 2.45-GHz microwave-driven Cs-free H- source was improved based on the experimental H- source at Peking University (PKU). Several structural improvements were implemented to meet the practical requirements of Xi'an Proton Application Facility (XiPaf). Firstly, the plasma chamber size was optimized to enhance the plasma intensity and stability. Secondly, the filter magnetic field and electron deflecting magnetic field were enhanced to reduce co-extracted electrons. Thirdly, a new two-electrode extraction system with farther electrode gap and enhanced water cooling ability to diminish spark and sputter during beam extraction was applied. At last, the direct H- current measuring method was adopted by the arrangement of a new pair of bending magnets before Faraday cup (FC) to remove residual electrons. With these improvements, electron cyclotron resonance (ECR) magnetic field optimization experiments and operation parameter variation experiments were carried out on the H- ion source and a maximum 8.5-mA pure H- beam was extracted at 50 kV with the time structure of 100 Hz/0.3 ms. The root-mean-square (RMS) emittance of the beam is 0.25π·mm·mrad. This improved H- source and extraction system were maintenance-free for more than 200 hours in operation.

关键词: electron cyclotron resonance (ECR) ion source, hydrogen plasma, negative ion beam, plasma application

Abstract:

A practical 2.45-GHz microwave-driven Cs-free H- source was improved based on the experimental H- source at Peking University (PKU). Several structural improvements were implemented to meet the practical requirements of Xi'an Proton Application Facility (XiPaf). Firstly, the plasma chamber size was optimized to enhance the plasma intensity and stability. Secondly, the filter magnetic field and electron deflecting magnetic field were enhanced to reduce co-extracted electrons. Thirdly, a new two-electrode extraction system with farther electrode gap and enhanced water cooling ability to diminish spark and sputter during beam extraction was applied. At last, the direct H- current measuring method was adopted by the arrangement of a new pair of bending magnets before Faraday cup (FC) to remove residual electrons. With these improvements, electron cyclotron resonance (ECR) magnetic field optimization experiments and operation parameter variation experiments were carried out on the H- ion source and a maximum 8.5-mA pure H- beam was extracted at 50 kV with the time structure of 100 Hz/0.3 ms. The root-mean-square (RMS) emittance of the beam is 0.25π·mm·mrad. This improved H- source and extraction system were maintenance-free for more than 200 hours in operation.

Key words: electron cyclotron resonance (ECR) ion source, hydrogen plasma, negative ion beam, plasma application

中图分类号:  (Plasma heating by microwaves; ECR, LH, collisional heating)

  • 52.50.Sw
52.50.Dg (Plasma sources) 52.27.Cm (Multicomponent and negative-ion plasmas) 52.77.-j (Plasma applications)