中国物理B ›› 2012, Vol. 21 ›› Issue (4): 47302-047302.doi: 10.1088/1674-1056/21/4/047302

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

刘紫玉,张培健,孟洋,李栋,孟庆宇,李建奇,赵宏武   

  • 收稿日期:2011-10-28 修回日期:2011-11-09 出版日期:2012-02-29 发布日期:2012-02-29
  • 通讯作者: 赵宏武,hwzhao@iphy.ac.cn E-mail:hwzhao@iphy.ac.cn

The influence of interfacial barrier engineering on the resistance switching of In2O3:SnO2/TiO2/In2O3:SnO2 device

Liu Zi-Yu(刘紫玉), Zhang Pei-Jian(张培健), Meng Yang(孟洋), Li Dong(李栋), Meng Qing-Yu(孟庆宇), Li Jian-Qi(李建奇), and Zhao Hong-Wu(赵宏武)   

  1. Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
  • Received:2011-10-28 Revised:2011-11-09 Online:2012-02-29 Published:2012-02-29
  • Contact: Zhao Hong-Wu,hwzhao@iphy.ac.cn E-mail:hwzhao@iphy.ac.cn
  • Supported by:
    Project supported by the National Basic Research Program of China (Grant No. 2009CB930803), the National Natural Science Foundation of China (Grant No. 10834012), and the Innovation Foundation of the Chinese Academy of Sciences (Grant No. KJCX2-YW-W24).

Abstract: The I-V characteristics of In2O3:SnO2/TiO2/In2O3:SnO2 junctions with different interfacial barriers are investigated by comparing experiments. A two-step resistance switching process is found for samples with two interfacial barriers produced by specific thermal treatment on the interfaces. The nonsynchronous occurrence of conducting filament formation through the oxide bulk and the reduction in the interfacial barrier due to the migration of oxygen vacancies under the electric field is supposed to explain the two-step resistive switching process. The unique switching properties of the device, based on interfacial barrier engineering, could be exploited for novel applications in nonvolatile memory devices.

Key words: resistance switching, interfacial Schottky barrier, oxygen vacancy, two-step switching

中图分类号:  (Electronic transport in interface structures)

  • 73.40.-c
73.50.-h (Electronic transport phenomena in thin films)