中国物理B ›› 2010, Vol. 19 ›› Issue (7): 76802-076802.doi: 10.1088/1674-1056/19/7/076802

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A novel method for sacrificial layer release in MEMS devices fabrication

石莎莉, 陈大鹏, 景玉鹏, 欧毅, 叶甜春, 徐秋霞   

  1. Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • 收稿日期:2009-03-04 修回日期:2010-01-12 出版日期:2010-07-15 发布日期:2010-07-15

A novel method for sacrificial layer release in MEMS devices fabrication

Shi Sha-Li (石莎莉), Chen Da-Peng (陈大鹏), Jing Yu-Peng (景玉鹏), Ou Yi (欧毅), Ye Tian-Chun (叶甜春), Xu Qiu-Xia (徐秋霞)   

  1. Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • Received:2009-03-04 Revised:2010-01-12 Online:2010-07-15 Published:2010-07-15

摘要: During the forming process of the free-standing structure or the functional cavity when releasing the high aspect ratio sacrificial layer, such structures tend to stick to the substrate due to capillary force. This paper describes the application of pull-in length conception as design rules to a novel `dimpled' method in releasing sacrificial layer. Based on the conception of pull-in length in adhering phenomenon, the fabrication and releasing sacrificial layer methods using micro bumps based on the silicon substrate were presented. According to the thermal isolation performances of one kind of micro electromechanical system device thermal shear stress sensor, the sacrificial layers were validated to be successfully released.

Abstract: During the forming process of the free-standing structure or the functional cavity when releasing the high aspect ratio sacrificial layer, such structures tend to stick to the substrate due to capillary force. This paper describes the application of pull-in length conception as design rules to a novel `dimpled' method in releasing sacrificial layer. Based on the conception of pull-in length in adhering phenomenon, the fabrication and releasing sacrificial layer methods using micro bumps based on the silicon substrate were presented. According to the thermal isolation performances of one kind of micro electromechanical system device thermal shear stress sensor, the sacrificial layers were validated to be successfully released.

Key words: sacrificial layer, adhering, pull in length, bump

中图分类号:  (Micro- and nano-electromechanical systems (MEMS/NEMS) and devices)

  • 85.85.+j
81.65.Ps (Polishing, grinding, surface finishing) 07.10.Cm (Micromechanical devices and systems)