中国物理B ›› 2015, Vol. 24 ›› Issue (10): 108102-108102.doi: 10.1088/1674-1056/24/10/108102
• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇 下一篇
赵蔚a b, 杜霖元a, 蒋昭毅a, 尹辰辰a, 于威a, 傅广生a
Zhao Wei (赵蔚)a b, Du Lin-Yuan (杜霖元)a, Jiang Zhao-Yi (蒋昭毅)a, Yin Chen-Chen (尹辰辰)a, Yu Wei (于威)a, Fu Guang-Sheng (傅广生)a
摘要: By using the plasma enhanced chemical vapor deposition (PECVD) technique, amorphous silicon oxide films containing nanocrystalline silicon grain (nc-SiOx:H) are deposited, and the bonding configurations and optical absorption properties of the films are investigated. The grain size can be well controlled by varying the hydrogen and oxygen content, and the largest size is obtained when the hydrogen dilution ratio R is 33. The results show that the crystallinity and the grain size of the film first increased and then decreased as R increased. The highest degree of crystallinity is obtained at R=30. The analyses of bonding characteristics and light absorption characteristics show that the incorporation of hydrogen leads to an increase of overall bonding oxygen content in the film, and the film porosity first increases and then decreases. When R=30, the film can be more compact, the optical absorption edge of the film is blue shifted, and the film has a lower activation energy.
中图分类号: (Nanocrystalline materials)