中国物理B ›› 2015, Vol. 24 ›› Issue (10): 108102-108102.doi: 10.1088/1674-1056/24/10/108102

• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇    下一篇

Influences of hydrogen dilution on microstructure and optical absorption characteristics of nc-SiOx:H film

赵蔚a b, 杜霖元a, 蒋昭毅a, 尹辰辰a, 于威a, 傅广生a   

  1. a Hebei Key Laboratory of Optic-electronic Information Materials, College of Physics Scienceand Technology, Hebei University, Baoding 071002, China;
    b School of Science, Hebei University of Engineering, Handan 056038, China
  • 收稿日期:2015-02-13 修回日期:2015-06-12 出版日期:2015-10-05 发布日期:2015-10-05
  • 基金资助:
    Project supported by the Key Basic Research Project of Hebei Province, China (Grant No. 12963930D) and the Natural Science Foundation of Hebei Province, China (Grant Nos. F2013201250 and B2012402011).

Influences of hydrogen dilution on microstructure and optical absorption characteristics of nc-SiOx:H film

Zhao Wei (赵蔚)a b, Du Lin-Yuan (杜霖元)a, Jiang Zhao-Yi (蒋昭毅)a, Yin Chen-Chen (尹辰辰)a, Yu Wei (于威)a, Fu Guang-Sheng (傅广生)a   

  1. a Hebei Key Laboratory of Optic-electronic Information Materials, College of Physics Scienceand Technology, Hebei University, Baoding 071002, China;
    b School of Science, Hebei University of Engineering, Handan 056038, China
  • Received:2015-02-13 Revised:2015-06-12 Online:2015-10-05 Published:2015-10-05
  • Contact: Yu Wei E-mail:yuwei@hbu.edu.cn
  • Supported by:
    Project supported by the Key Basic Research Project of Hebei Province, China (Grant No. 12963930D) and the Natural Science Foundation of Hebei Province, China (Grant Nos. F2013201250 and B2012402011).

RichHTML

0

PDF (PC)

338

赞

摘要： By using the plasma enhanced chemical vapor deposition (PECVD) technique, amorphous silicon oxide films containing nanocrystalline silicon grain (nc-SiOx:H) are deposited, and the bonding configurations and optical absorption properties of the films are investigated. The grain size can be well controlled by varying the hydrogen and oxygen content, and the largest size is obtained when the hydrogen dilution ratio R is 33. The results show that the crystallinity and the grain size of the film first increased and then decreased as R increased. The highest degree of crystallinity is obtained at R=30. The analyses of bonding characteristics and light absorption characteristics show that the incorporation of hydrogen leads to an increase of overall bonding oxygen content in the film, and the film porosity first increases and then decreases. When R=30, the film can be more compact, the optical absorption edge of the film is blue shifted, and the film has a lower activation energy.

关键词: nc-SiOx:H, microstructure, optical absorption

Abstract: By using the plasma enhanced chemical vapor deposition (PECVD) technique, amorphous silicon oxide films containing nanocrystalline silicon grain (nc-SiOx:H) are deposited, and the bonding configurations and optical absorption properties of the films are investigated. The grain size can be well controlled by varying the hydrogen and oxygen content, and the largest size is obtained when the hydrogen dilution ratio R is 33. The results show that the crystallinity and the grain size of the film first increased and then decreased as R increased. The highest degree of crystallinity is obtained at R=30. The analyses of bonding characteristics and light absorption characteristics show that the incorporation of hydrogen leads to an increase of overall bonding oxygen content in the film, and the film porosity first increases and then decreases. When R=30, the film can be more compact, the optical absorption edge of the film is blue shifted, and the film has a lower activation energy.

Key words: nc-SiOx:H, microstructure, optical absorption

中图分类号:  (Nanocrystalline materials)

  • 81.07.Bc
78.67.Bf (Nanocrystals, nanoparticles, and nanoclusters) 71.35.Cc (Intrinsic properties of excitons; optical absorption spectra)