中国物理B ›› 2016, Vol. 25 ›› Issue (10): 106801-106801.doi: 10.1088/1674-1056/25/10/106801

• CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES • 上一篇    下一篇

Thick c-BN films deposited by radio frequency magnetron sputtering in argon/nitrogen gas mixture with additional hydrogen gas

Yan Zhao(赵艳), Wei Gao(高伟), Bo Xu(徐博), Ying-Ai Li(李英爱), Hong-Dong Li(李红东), Guang-Rui Gu(顾广瑞), Hong Yin(殷红)   

  1. 1 State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
    2 Department of Physics, College of Science, Yanbian University, Yanji 133002, China
  • 收稿日期:2016-03-16 修回日期:2016-05-23 出版日期:2016-10-05 发布日期:2016-10-05
  • 通讯作者: Hong Yin E-mail:hyin@jlu.edu.cn
  • 基金资助:

    Project supported by the National Natural Science Foundation of China (Grant Nos. 51572105, 61504046, and 51272224), the Scientific Research Foundation for the Returned Overseas Chinese Scholars, State Education Ministry, China, the Development and Reform Commission of Jilin Province, China (Grant No. 2015Y050), and the Scientific Research Foundation for the Returned Overseas of Jilin Province, China.

Thick c-BN films deposited by radio frequency magnetron sputtering in argon/nitrogen gas mixture with additional hydrogen gas

Yan Zhao(赵艳)1, Wei Gao(高伟)1, Bo Xu(徐博)2, Ying-Ai Li(李英爱)1, Hong-Dong Li(李红东)1, Guang-Rui Gu(顾广瑞)2, Hong Yin(殷红)1   

  1. 1 State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China;
    2 Department of Physics, College of Science, Yanbian University, Yanji 133002, China
  • Received:2016-03-16 Revised:2016-05-23 Online:2016-10-05 Published:2016-10-05
  • Contact: Hong Yin E-mail:hyin@jlu.edu.cn
  • Supported by:

    Project supported by the National Natural Science Foundation of China (Grant Nos. 51572105, 61504046, and 51272224), the Scientific Research Foundation for the Returned Overseas Chinese Scholars, State Education Ministry, China, the Development and Reform Commission of Jilin Province, China (Grant No. 2015Y050), and the Scientific Research Foundation for the Returned Overseas of Jilin Province, China.

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摘要：

The excellent physical and chemical properties of cubic boron nitride (c-BN) film make it a promising candidate for various industry applications. However, the c-BN film thickness restricts its practical applications in many cases. Thus, it is indispensable to develop an economic, simple and environment-friend way to synthesize high-quality thick, stable c-BN films. High-cubic-content BN films are prepared on silicon (100) substrates by radio frequency (RF) magnetron sputtering from an h-BN target at low substrate temperature. Adhesions of the c-BN films are greatly improved by adding hydrogen to the argon/nitrogen gas mixture, allowing the deposition of a film up to 5-μm thick. The compositions and the microstructure morphologies of the c-BN films grown at different substrate temperatures are systematically investigated with respect to the ratio of H2 gas content to total working gas. In addition, a primary mechanism for the deposition of thick c-BN film is proposed.

关键词: cubic boron nitride, hydrogen plasmas, RF magnetron sputtering, growth diagram

Abstract:

The excellent physical and chemical properties of cubic boron nitride (c-BN) film make it a promising candidate for various industry applications. However, the c-BN film thickness restricts its practical applications in many cases. Thus, it is indispensable to develop an economic, simple and environment-friend way to synthesize high-quality thick, stable c-BN films. High-cubic-content BN films are prepared on silicon (100) substrates by radio frequency (RF) magnetron sputtering from an h-BN target at low substrate temperature. Adhesions of the c-BN films are greatly improved by adding hydrogen to the argon/nitrogen gas mixture, allowing the deposition of a film up to 5-μm thick. The compositions and the microstructure morphologies of the c-BN films grown at different substrate temperatures are systematically investigated with respect to the ratio of H2 gas content to total working gas. In addition, a primary mechanism for the deposition of thick c-BN film is proposed.

Key words: cubic boron nitride, hydrogen plasmas, RF magnetron sputtering, growth diagram

中图分类号:  (Nucleation and growth)

  • 68.55.A-
81.15.Cd (Deposition by sputtering) 68.35.B- (Structure of clean surfaces (and surface reconstruction))