›› 2014, Vol. 23 ›› Issue (7): 75204-075204.doi: 10.1088/1674-1056/23/7/075204

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇    下一篇

Atmospheric pressure plasma jet utilizing Ar and Ar/H2O mixtures and its applications to bacteria inactivation

程诚a b, 沈洁a, 肖德志a, 谢洪兵a, 兰彦a, 方世东a, 孟月东a, 朱剑豪b   

  1. a Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China;
    b Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, China
  • 收稿日期:2013-09-10 修回日期:2014-01-07 出版日期:2014-07-15 发布日期:2014-07-15
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No. 11005126), the Hefei Institute of Physical Science, Chinese Academy of Sciences Dean Fund, China (Grant No. YZJJ201331), and the City University of Hong Kong Applied Research Grant, China (Grant Nos. 9667066 and 9667069).

Atmospheric pressure plasma jet utilizing Ar and Ar/H2O mixtures and its applications to bacteria inactivation

Cheng Cheng (程诚)a b, Shen Jie (沈洁)a, Xiao De-Zhi (肖德志)a, Xie Hong-Bing (谢洪兵)a, Lan Yan (兰彦)a, Fang Shi-Dong (方世东)a, Meng Yue-Dong (孟月东)a, Chu Paul K (朱剑豪)b   

  1. a Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China;
    b Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, China
  • Received:2013-09-10 Revised:2014-01-07 Online:2014-07-15 Published:2014-07-15
  • Contact: Cheng Cheng, Chu Paul K E-mail:chengcheng@ipp.ac.cn;paul.chu@cityu.edu.hk
  • About author:52.50.Dg; 94.20.Fg; 52.77.-j
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No. 11005126), the Hefei Institute of Physical Science, Chinese Academy of Sciences Dean Fund, China (Grant No. YZJJ201331), and the City University of Hong Kong Applied Research Grant, China (Grant Nos. 9667066 and 9667069).

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摘要： An atmospheric pressure plasma jet generated with Ar with H2O vapor is characterized and applied to inactivation of Bacillus subtilis spores. The emission spectra obtained from Ar/H2O plasma shows a higher intensity of OH radicals compared to pure argon at a specified H2O concentration. The gas temperature is estimated by comparing the simulated spectra of the OH band with experimental spectra. The excitation electron temperature is determined from the Boltzmann's plots and Stark broadening of the hydrogen Balmer Hβ line is applied to measure the electron density. The gas temperature, excitation electron temperature, and electron density of the plasma jet decrease with the increase of water vapor concentration at a fixed input voltage. The bacteria inactivation rate increases with the increase of OH generation reaching a maximum reduction at 2.6% (v/v) water vapor. Our results also show that the OH radicals generated by the Ar/H2O plasma jet only makes a limited contribution to spore inactivation and the shape change of the spores before and after plasma irradiation is discussed.

关键词: plasma sources, plasma temperature and density, plasma applications

Abstract: An atmospheric pressure plasma jet generated with Ar with H2O vapor is characterized and applied to inactivation of Bacillus subtilis spores. The emission spectra obtained from Ar/H2O plasma shows a higher intensity of OH radicals compared to pure argon at a specified H2O concentration. The gas temperature is estimated by comparing the simulated spectra of the OH band with experimental spectra. The excitation electron temperature is determined from the Boltzmann's plots and Stark broadening of the hydrogen Balmer Hβ line is applied to measure the electron density. The gas temperature, excitation electron temperature, and electron density of the plasma jet decrease with the increase of water vapor concentration at a fixed input voltage. The bacteria inactivation rate increases with the increase of OH generation reaching a maximum reduction at 2.6% (v/v) water vapor. Our results also show that the OH radicals generated by the Ar/H2O plasma jet only makes a limited contribution to spore inactivation and the shape change of the spores before and after plasma irradiation is discussed.

Key words: plasma sources, plasma temperature and density, plasma applications

中图分类号:  (Plasma sources)

  • 52.50.Dg
94.20.Fg (Plasma temperature and density) 52.77.-j (Plasma applications)