Synthesis of ZnO films with a special texture and enhanced field emission properties

doi:10.1088/1674-1056/20/10/105203

中国物理B ›› 2011, Vol. 20 ›› Issue (10): 105203-105203.doi: 10.1088/1674-1056/20/10/105203

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇下一篇

Synthesis of ZnO films with a special texture and enhanced field emission properties

王小平¹, 王丽军¹, 梅翠玉¹, 王子²

(1)College of Science, University of Shanghai for Science and Technology, Shanghai 200093, China; (2)School of Transportation Engineering, Tongji University, Shanghai 200092, China

收稿日期:2011-04-18 修回日期:2011-05-30 出版日期:2011-10-15 发布日期:2011-10-15
基金资助:
Project supported by the Science Foundation of Shanghai Human Resources and Social Security Bureau, China (Grant No. 2009023).

Synthesis of ZnO films with a special texture and enhanced field emission properties

Wang Xiao-Ping(王小平)^a)^†, Wang Zi(王子)^b), Wang Li-Jun(王丽军)^a), and Mei Cui-Yu(梅翠玉)^a)

^a College of Science, University of Shanghai for Science and Technology, Shanghai 200093, China; ^b School of Transportation Engineering, Tongji University, Shanghai 200092, China

Received:2011-04-18 Revised:2011-05-30 Online:2011-10-15 Published:2011-10-15
Supported by:
Project supported by the Science Foundation of Shanghai Human Resources and Social Security Bureau, China (Grant No. 2009023).

摘要/Abstract

摘要： ZnO films with special textures are fabricated on Mo-coated Al₂O₃ ceramic substrates by the catalyst-free electron beam evaporation method, and the as-deposited films are treated by hydrogen plasma. It is found that the surface morphologies of the films are changed significantly after hydrogen plasma treatment and that the films consist of vertically standing and intersecting nanosheets. A lower turn-on field of 1.2 V/μm and an enhanced current density ～0.11 mA/cm² at 2.47 V/μm are achieved. The low threshold field and the high emission current density are attributed primarily to the unique shape and smaller resistivity of the ZnO nanosheet films.

Abstract: ZnO films with special textures are fabricated on Mo-coated Al₂O₃ ceramic substrates by the catalyst-free electron beam evaporation method, and the as-deposited films are treated by hydrogen plasma. It is found that the surface morphologies of the films are changed significantly after hydrogen plasma treatment and that the films consist of vertically standing and intersecting nanosheets. A lower turn-on field of 1.2 V/μm and an enhanced current density ～0.11 mA/cm² at 2.47 V/μm are achieved. The low threshold field and the high emission current density are attributed primarily to the unique shape and smaller resistivity of the ZnO nanosheet films.

Key words: nano-ZnO thin films, hydrogen plasma treatment, field electron emission, microwave plasma chemical vapour deposition

中图分类号: (Plasma applications)

52.77.-j

79.60.Jv (Interfaces; heterostructures; nanostructures) 79.70.+q (Field emission, ionization, evaporation, and desorption)

王小平, 王子, 王丽军, 梅翠玉. Synthesis of ZnO films with a special texture and enhanced field emission properties[J]. 中国物理B, 2011, 20(10): 105203-105203.

Wang Xiao-Ping(王小平), Wang Zi(王子), Wang Li-Jun(王丽军), and Mei Cui-Yu(梅翠玉) . Synthesis of ZnO films with a special texture and enhanced field emission properties[J]. Chin. Phys. B, 2011, 20(10): 105203-105203.

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Synthesis of ZnO films with a special texture and enhanced field emission properties

Synthesis of ZnO films with a special texture and enhanced field emission properties

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