[1] |
Forrest S R 2004 Nature 428 911
|
[2] |
Zhu X Z, Han Y Y, Liu Y, Lv P, Xu M F, Ruan K Q, Wang Z K, Jie J S and Liao L S 2013 Org. Electron. 14 3348
|
[3] |
Qu S, Peng J C and Li H J 2005 Chin. Phys. Lett. 22 719
|
[4] |
Peng Y Q, He X Y and Tai X S 2002 Chin. Phys. 11 1076
|
[5] |
Wang Z K, Lou Y H, Naka S and Okada H 2011 AIP Adv. 1 032130
|
[6] |
Burrows P E, Bulovic V, Forrest S R, Sapochak L S, McCarty D M and Thompson M E 1994 Appl. Phys. Lett. 65 2922
|
[7] |
Nan J, Xie Z Y and Dai G R 1998 Chin. Phys. Lett. 15 537
|
[8] |
Ma Y G, Tian W J and Shen J C 2000 Chin. Phys. Lett. 17 454
|
[9] |
Wang Z K, Naka S and Okada H 2010 Jpn. J. Appl. Phys. 49 01AA02
|
[10] |
Popovic Z D and Aziz H 2002 IEEE J. Select. Topics Quantum Electron. 8 362
|
[11] |
Aziz H and Popovic Z D 2004 Chem. Mater. 16 4522
|
[12] |
Wang Z K, Naka S and Okada H 2009 Thin Solid Films 518 497
|
[13] |
Wu C C, Wu C I, Sturm J C and Kahn A 1997 Appl. Phys. Lett. 70 1348
|
[14] |
Friend R H, Gymer R W, Holmes A B, Burroughes J H, Marks R N, Taliani C, Bradely D D C, Santos D A D, Bredas J L, Logdlund M and Salaneck W R 1999 Nature 397 121
|
[15] |
Nuesch F, Forsythe E W, Le Q T, Gao Y and Rothberg L J 2000 J. Appl. Phys. 87 7973
|
[16] |
Hsieh H C, Chang S C and Tsai Y M 2003 SID 03 Digest 498
|
[17] |
Wang Z K, Lou Y H, Naka S and Okada H 2011 ACS Appl. Mater. Interfaces 3 2496
|
[18] |
Jonda C, Mayer A B R, Stolz U, Llschner A and Karbach A 2000 J. Mater. Sci. 35 5645
|
[19] |
Tak Y H, Kim K B, Park H G, Lee K H and Lee J R 2002 Thin Solid Films 411 12
|
[20] |
Kim K B, Tak Y H, Han Y S, Baik K H, Yoon M H and Lee M H 2003 Jpn. J. Appl. Phys. 42 L438
|
[21] |
Fukushi Y, Kominami H, Nakanishi Y and Hatanaka Y 2005 Appl. Sur. Sci. 244 537
|
[22] |
Choi B, Rhee J and Lee H H 2001 Appl. Phys. Lett. 79 2109
|
[23] |
Campbell I H, Kress J D, Martin R L, Smith D L, Barashkov N N and Ferraris J P 1997 Appl. Phys. Lett. 71 3528
|
[24] |
Mohir M, Kakinuma H and Sakamoto M 1990 Jpn. J. Appl. Phys. 29 1932
|
[25] |
Huang C, Su Y and Wu S 2004 Mater. Chem. Phys. 84 146
|