中国物理B ›› 2009, Vol. 18 ›› Issue (9): 4007-4012.doi: 10.1088/1674-1056/18/9/065
Bosi M1, ?ztürk M Kemal2, Y1ld1z A3, ?z?elik S4, Kasap M4
Yildiz Aa), Öztürk M Kemalb)†, Bosi Mc), Özçelik Sd), and Kasap Md)
摘要: We present a study on n-type ternary InGaN layers grown by atmospheric pressure metalorganic vapour phase epitaxy (MOVPE) on GaN template/(0001) sapphire substrate. An investigation of the different growth conditions on n-type InxGa_1-xN (x=0.06-0.135) alloys was done for a series of five samples. The structural, electrical and optical properties were characterized by high resolution x-ray diffraction (HRXRD), Hall effect and photoluminescence (PL). Experimental results showed that different growth conditions, namely substrate rotation (SR) and change of total H2 flow (THF), strongly affect the properties of InGaN layers. This case can be clearly observed from the analytical results. When the SR speed decreased, the HRXRD scan peak of the samples shifted along a higher angle. Therefore, increasing the SR speed changed important structural properties of InGaN alloys such as peak broadening, values of strain, lattice parameters and defects including tilt, twist and dislocation density. From PL results it is observed that the growth conditions can be changed to control the emission wavelength and it is possible to shift the emission wavelength towards the green. Hall effect measurement has shown that the resistivity of the samples changes dramatically when THF changes.
中图分类号: (Thin film structure and morphology)