中国物理B ›› 2004, Vol. 13 ›› Issue (8): 1334-1338.doi: 10.1088/1009-1963/13/8/027

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Temperature dependence of Hall electron density of GaN-based heterostructures

张金凤, 张进城, 郝跃   

  1. Institute of Microelectronics, Xidian University, Xi'an 710071, China
  • 收稿日期:2003-11-27 修回日期:2004-02-11 出版日期:2004-06-21 发布日期:2005-06-30
  • 基金资助:
    Project supported by the State Key Development Programme for Basic Research of China (Grant No 2002CB311904).

Temperature dependence of Hall electron density of GaN-based heterostructures

Zhang Jin-Feng (张金凤), Zhang Jin-Cheng (张进城), Hao Yue (郝跃)   

  1. Institute of Microelectronics, Xidian University, Xi'an 710071, China
  • Received:2003-11-27 Revised:2004-02-11 Online:2004-06-21 Published:2005-06-30
  • Supported by:
    Project supported by the State Key Development Programme for Basic Research of China (Grant No 2002CB311904).

摘要: The theoretic calculation and analysis of the temperature dependence of Hall electron density of a sample AlGaN/GaN heterostructure has been carried out in the temperature range from 77 to 300K. The densities of the two-dimensional electron gas and the bulk electrons are solved by self-consistent calculation of one-dimensional Schr?dinger and Poisson equations at different temperatures, which allow for the variation of energy gap and structure strain, and are used for evaluation of the temperature dependence of Hall electron density. The calculated Hall electron density agrees with the measured one quite well with the appropriate bulk mobility data. Analysis revealed that for the temperature range considered, even in the heterostructures with a small bulk conductance the factors that determine the Hall mobility and electron density could be of different sources, and not just the two-dimensional electron gas as generally supposed.

关键词: GaN-based heterostructures, Hall electron density, coupled Schr?dinger-Poisson equations, temperature dependence

Abstract: The theoretic calculation and analysis of the temperature dependence of Hall electron density of a sample AlGaN/GaN heterostructure has been carried out in the temperature range from 77 to 300K. The densities of the two-dimensional electron gas and the bulk electrons are solved by self-consistent calculation of one-dimensional Schr?dinger and Poisson equations at different temperatures, which allow for the variation of energy gap and structure strain, and are used for evaluation of the temperature dependence of Hall electron density. The calculated Hall electron density agrees with the measured one quite well with the appropriate bulk mobility data. Analysis revealed that for the temperature range considered, even in the heterostructures with a small bulk conductance the factors that determine the Hall mobility and electron density could be of different sources, and not just the two-dimensional electron gas as generally supposed.

Key words: GaN-based heterostructures, Hall electron density, coupled Schr$\ddot{\rm o}$dinger-Poisson equations, temperature dependence

中图分类号:  (III-V and II-VI semiconductors)

  • 72.80.Ey
72.20.Ee (Mobility edges; hopping transport) 02.30.Jr (Partial differential equations) 73.40.Kp (III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions)