中国物理B ›› 2012, Vol. 21 ›› Issue (11): 114213-114213.doi: 10.1088/1674-1056/21/11/114213

• ELECTROMAGNETISM, OPTICS, ACOUSTICS, HEAT TRANSFER, CLASSICAL MECHANICS, AND FLUID DYNAMICS • 上一篇    下一篇

Temperature dependences of optical properties, chemical composition, structure, and laser damage in Ta2O5 films

许程a b, 杨帅a, 张生辉a, 牛继南a, 强颖怀a, 刘炯天b, 李大伟c   

  1. a School of Materials Science and Engineering, China University of Mining and Technology, Xuzhou 221116, China;
    b School of Chemical Engineering & Technology, China University of Mining and Technology, Xuzhou 221116, China;
    c Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 收稿日期:2012-05-14 修回日期:2012-05-29 出版日期:2012-10-01 发布日期:2012-10-01
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 61107080 and 50921002), the Natural Science Foundation of Jiangsu Province, China (Grant No. BK2011223), the Specialized Research Fund for the Doctoral Program of Higher Education of China (New Teachers) (Grant No. 20110095120018), the China Postdoctoral Science Foundation (Grant No. 20110491472), and the Fundamental Research Funds for the Central Universities, China (Grant No. 2012QNA03).

Temperature dependences of optical properties, chemical composition, structure, and laser damage in Ta2O5 films

Xu Cheng (许程)a b, Yang Shuai (杨帅)a, Zhang Sheng-Hui (张生辉)a, Niu Ji-Nan (牛继南)a, Qiang Ying-Huai (强颖怀)a, Liu Jiong-Tian (刘炯天)b, Li Da-Wei (李大伟 )c   

  1. a School of Materials Science and Engineering, China University of Mining and Technology, Xuzhou 221116, China;
    b School of Chemical Engineering & Technology, China University of Mining and Technology, Xuzhou 221116, China;
    c Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • Received:2012-05-14 Revised:2012-05-29 Online:2012-10-01 Published:2012-10-01
  • Contact: Qiang Ying-Huai E-mail:yhqiang@cumt.edu.cn
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 61107080 and 50921002), the Natural Science Foundation of Jiangsu Province, China (Grant No. BK2011223), the Specialized Research Fund for the Doctoral Program of Higher Education of China (New Teachers) (Grant No. 20110095120018), the China Postdoctoral Science Foundation (Grant No. 20110491472), and the Fundamental Research Funds for the Central Universities, China (Grant No. 2012QNA03).

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摘要： Ta2O5 films are prepared by e-beam evaporation with varied deposition temperatures, annealing temperatures, and annealing time. The effects of temperature on the optical properties, chemical composition, structure, and laser-induced damage threshold (LIDT) are systematically investigated. The results show that the increase of deposition temperature decreases the film transmittance slightly, yet annealing below 923 K is beneficial for the transmittance. The XRD analysis reveals that the film is in the amorphous phase when annealed below 873 K and in thehexagonal phase when annealed at 1073 K. While an interesting near-crystalline phase is found when annealed at 923 K. The LIDT increases with the deposition temperature increasing, whereas it increases firstly and then decreases as the annealing temperature increases. In addition, the increase of annealing time from 4 h to 12 h is favorable to improving the LIDT, which is mainly due the improvement of the O/Ta ratio. The highest LIDT film is obtained when annealed at 923 K, owing to the lowest density of defect.

关键词: Ta2O5 film, laser damage, deposition, annealing

Abstract: Ta2O5 films are prepared by e-beam evaporation with varied deposition temperatures, annealing temperatures, and annealing time. The effects of temperature on the optical properties, chemical composition, structure, and laser-induced damage threshold (LIDT) are systematically investigated. The results show that the increase of deposition temperature decreases the film transmittance slightly, yet annealing below 923 K is beneficial for the transmittance. The XRD analysis reveals that the film is in the amorphous phase when annealed below 873 K and in the hexagonal phase when annealed at 1073 K. While an interesting near-crystalline phase is found when annealed at 923 K. The LIDT increases with the deposition temperature increasing, whereas it increases firstly and then decreases as the annealing temperature increases. In addition, the increase of annealing time from 4 h to 12 h is favorable to improving the LIDT, which is mainly due the improvement of the O/Ta ratio. The highest LIDT film is obtained when annealed at 923 K, owing to the lowest density of defect.

Key words: Ta2O5 film, laser damage, deposition, annealing

中图分类号:  (Optical elements, devices, and systems)

  • 42.79.-e
68.60.-p (Physical properties of thin films, nonelectronic) 81.15.Dj (E-beam and hot filament evaporation deposition)