中国物理B ›› 2017, Vol. 26 ›› Issue (7): 75203-075203.doi: 10.1088/1674-1056/26/7/075203

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇    下一篇

Influence of a centered dielectric tube on inductively coupled plasma source: Chamber structures and plasma characteristics

Zhen-Hua Bi(毕振华), Yi Hong(洪义), Guang-Jiu Lei(雷光玖), Shuai Wang(王帅), You-Nian Wang(王友年), Dong-Ping Liu(刘东平)   

  1. 1 Liaoning Key Laboratory of Optoelectronic Films & Materials, School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China;
    2 Southwestern Institute of Physics, Chengdu 610041, China;
    3 Physics Department, School of Science, Northeastern University, Shenyang 110819, China;
    4 School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China
  • 收稿日期:2016-11-30 修回日期:2017-03-13 出版日期:2017-07-05 发布日期:2017-07-05
  • 通讯作者: Dong-Ping Liu E-mail:dongping.liu@dlnu.edu.cn
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos.11305028,11305032,and 11320101005).

Influence of a centered dielectric tube on inductively coupled plasma source: Chamber structures and plasma characteristics

Zhen-Hua Bi(毕振华)1, Yi Hong(洪义)1, Guang-Jiu Lei(雷光玖)2, Shuai Wang(王帅)3, You-Nian Wang(王友年)4, Dong-Ping Liu(刘东平)1   

  1. 1 Liaoning Key Laboratory of Optoelectronic Films & Materials, School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China;
    2 Southwestern Institute of Physics, Chengdu 610041, China;
    3 Physics Department, School of Science, Northeastern University, Shenyang 110819, China;
    4 School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China
  • Received:2016-11-30 Revised:2017-03-13 Online:2017-07-05 Published:2017-07-05
  • Contact: Dong-Ping Liu E-mail:dongping.liu@dlnu.edu.cn
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos.11305028,11305032,and 11320101005).

RichHTML

0

PDF (PC)

204

赞

摘要： A high-density RF ion source is an essential part of a neutral beam injector. In this study, the authors attempt to retrofit an original regular RF ion source reactor by inserting a thin dielectric tube through the symmetric axis of the discharge chamber. With the aid of this inner tube, the reactor is capable of generating a radial magnetic field instead of the original transverse magnetic field, which solves the E×B drift problem in the current RF ion source structure. To study the disturbance of the dielectric tube, a fluid model is introduced to study the plasma parameters with or without the internal dielectric tube, based on the inductively coupled plasma (ICP) reactor. The simulation results show that while introducing the internal dielectric tube into the ICP reactor, both the plasma density and plasma potential have minor influence during the discharge process, and there is good uniformity at the extraction region. The influence of the control parameters reveals that the plasma densities at the extraction region decrease first and subsequently slow down while enhancing the diffusion region.

关键词: neutral beam ion source, inductively coupled plasma (ICP), fluid model

Abstract: A high-density RF ion source is an essential part of a neutral beam injector. In this study, the authors attempt to retrofit an original regular RF ion source reactor by inserting a thin dielectric tube through the symmetric axis of the discharge chamber. With the aid of this inner tube, the reactor is capable of generating a radial magnetic field instead of the original transverse magnetic field, which solves the E×B drift problem in the current RF ion source structure. To study the disturbance of the dielectric tube, a fluid model is introduced to study the plasma parameters with or without the internal dielectric tube, based on the inductively coupled plasma (ICP) reactor. The simulation results show that while introducing the internal dielectric tube into the ICP reactor, both the plasma density and plasma potential have minor influence during the discharge process, and there is good uniformity at the extraction region. The influence of the control parameters reveals that the plasma densities at the extraction region decrease first and subsequently slow down while enhancing the diffusion region.

Key words: neutral beam ion source, inductively coupled plasma (ICP), fluid model

中图分类号:  (Plasma simulation)

  • 52.65.-y
52.50.Dg (Plasma sources)