中国物理B ›› 2014, Vol. 23 ›› Issue (8): 87504-087504.doi: 10.1088/1674-1056/23/8/087504

• SPECIAL TOPI—International Conference on Nanoscience & Technology, China 2013 • 上一篇    下一篇

Influence of magnetic layer thickness on [Fe80Ni20–O/SiO2]n multilayer thin films

魏建清, 耿昊, 徐磊, 王来森, 陈远志, 岳光辉, 彭栋梁   

  1. Department of Materials Science and Engineering, College of Materials, Xiamen University, Xiamen 361005, China
  • 收稿日期:2013-09-04 修回日期:2014-03-26 出版日期:2014-08-15 发布日期:2014-08-15
  • 基金资助:
    Project supported by the National Basic Research Program of China (Grant No. 2012CB933103), the National Natural Science Foundation of China (Grant Nos. 51371154, 51301145, 51171158, and 50825101), and the Fundamental Research Funds for the Central Universities of China (Grant No. 201212G001).

Influence of magnetic layer thickness on [Fe80Ni20–O/SiO2]n multilayer thin films

Wei Jian-Qing (魏建清), Geng Hao (耿昊), Xu Lei (徐磊), Wang Lai-Sen (王来森), Chen Yuan-Zhi (陈远志), Yue Guang-Hui (岳光辉), Peng Dong-Liang (彭栋梁)   

  1. Department of Materials Science and Engineering, College of Materials, Xiamen University, Xiamen 361005, China
  • Received:2013-09-04 Revised:2014-03-26 Online:2014-08-15 Published:2014-08-15
  • Contact: Wang Lai-Sen, Peng Dong-Liang E-mail:wangls@xmu.edu.cn;dlpeng@xmu.edu.cn
  • Supported by:
    Project supported by the National Basic Research Program of China (Grant No. 2012CB933103), the National Natural Science Foundation of China (Grant Nos. 51371154, 51301145, 51171158, and 50825101), and the Fundamental Research Funds for the Central Universities of China (Grant No. 201212G001).

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摘要： In the present work, a series of [Fe80Ni20-O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of Fe80Ni20-O magnetic films range from 10 nm to 30 nm. All films present obvious in-plane uniaxial magnetic anisotropy. With increasing the Fe80Ni20-O layer thickness, the saturation magnetization increases slightly and the coercivity becomes larger due to the enlarged grain size, which could weaken the soft magnetic property. The results of high frequency magnetic permeability characterization show that films with thin magnetic layer are more suitable for practical applications. When the thickness of Fe80Ni20-O layer is 10 nm, the multilayer film exhibits the most comprehensive high-frequency magnetic property with a real permeability of 300 in gigahertz range.

关键词: magnetron sputtering, multilayer films, soft magnetic property, high frequency permeability

Abstract: In the present work, a series of [Fe80Ni20-O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of Fe80Ni20-O magnetic films range from 10 nm to 30 nm. All films present obvious in-plane uniaxial magnetic anisotropy. With increasing the Fe80Ni20-O layer thickness, the saturation magnetization increases slightly and the coercivity becomes larger due to the enlarged grain size, which could weaken the soft magnetic property. The results of high frequency magnetic permeability characterization show that films with thin magnetic layer are more suitable for practical applications. When the thickness of Fe80Ni20-O layer is 10 nm, the multilayer film exhibits the most comprehensive high-frequency magnetic property with a real permeability of 300 in gigahertz range.

Key words: magnetron sputtering, multilayer films, soft magnetic property, high frequency permeability

中图分类号:  (Magnetic properties of nanostructures)

  • 75.75.-c
75.70.Cn (Magnetic properties of interfaces (multilayers, superlattices, heterostructures)) 75.30.Gw (Magnetic anisotropy) 75.50.Gg (Ferrimagnetics)