中国物理B ›› 2004, Vol. 13 ›› Issue (12): 2115-2120.doi: 10.1088/1009-1963/13/12/024

• CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES • 上一篇    下一篇

Modelling of an obliquely deposited thin film in three dimensions by kinetic Monte Carlo method

刘祖黎, 张雪锋, 姚凯伦, 魏合林, 黄运米   

  1. Department of Physics, Huazhong University of Science and Technology, Wuhan 430074, China
  • 收稿日期:2004-04-29 修回日期:2004-07-12 出版日期:2005-03-17 发布日期:2005-03-17
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos 10174023 and 90103034).

Modelling of an obliquely deposited thin film in three dimensions by kinetic Monte Carlo method

Liu Zu-Li (刘祖黎), Zhang Xue-Feng (张雪锋), Yao Kai-Lun (姚凯伦), Wei He-Lin (魏合林), Huang Yun-Mi (黄运米)   

  1. Department of Physics, Huazhong University of Science and Technology, Wuhan 430074, China
  • Received:2004-04-29 Revised:2004-07-12 Online:2005-03-17 Published:2005-03-17
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos 10174023 and 90103034).

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摘要： A simulation of the growth of an obliquely deposited thin film in a three-dimensional lattice was made using kinetic Monte Carlo method. Cu growth in three dimensions on a (001) substrate with high deposition rates has been simulated in this model. We mainly investigated the variation of three-dimensional morphology and microstructure of films with incidence angle of sputtered flux. The relation of roughness and densities of films with incidence angle was also investigated. The simulation results show that the surface roughness increases and the relative density of thin film decreases with increasing incidence angle, respectively; the columnar structures were separated by void regions for large incidence angle and high deposition rate. The simulation results are in good agreement with experimental results. However, the orientation angle of columns is not completely consistent with the classical tangent rule.

Abstract: A simulation of the growth of an obliquely deposited thin film in a three-dimensional lattice was made using kinetic Monte Carlo method. Cu growth in three dimensions on a (001) substrate with high deposition rates has been simulated in this model. We mainly investigated the variation of three-dimensional morphology and microstructure of films with incidence angle of sputtered flux. The relation of roughness and densities of films with incidence angle was also investigated. The simulation results show that the surface roughness increases and the relative density of thin film decreases with increasing incidence angle, respectively; the columnar structures were separated by void regions for large incidence angle and high deposition rate. The simulation results are in good agreement with experimental results. However, the orientation angle of columns is not completely consistent with the classical tangent rule.

Key words: kinetic Monte Carlo method, oblique deposition, three-dimensional morphology, microstructure

中图分类号:  (Nucleation and growth)

  • 68.55.A-
81.15.Aa (Theory and models of film growth)