中国物理B ›› 2017, Vol. 26 ›› Issue (10): 106801-106801.doi: 10.1088/1674-1056/26/10/106801

• CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES • 上一篇    下一篇

Structural, optical, and electrical properties of Cu-doped ZrO2 films prepared by magnetron co-sputtering

Nian-Qi Yao(姚念琦), Zhi-Chao Liu(刘智超), Guang-Rui Gu(顾广瑞), Bao-Jia Wu(吴宝嘉)   

  1. Department of Physics, College of Science, Yanbian University, Yanji 133002, China
  • 收稿日期:2017-04-10 修回日期:2017-06-27 出版日期:2017-10-05 发布日期:2017-10-05
  • 通讯作者: Guang-Rui Gu E-mail:grgu@ybu.edu.cn
  • 基金资助:

    Project supported by the National Natural Science Foundation of China (Grant Nos. 51272224 and 11164031).

Structural, optical, and electrical properties of Cu-doped ZrO2 films prepared by magnetron co-sputtering

Nian-Qi Yao(姚念琦), Zhi-Chao Liu(刘智超), Guang-Rui Gu(顾广瑞), Bao-Jia Wu(吴宝嘉)   

  1. Department of Physics, College of Science, Yanbian University, Yanji 133002, China
  • Received:2017-04-10 Revised:2017-06-27 Online:2017-10-05 Published:2017-10-05
  • Contact: Guang-Rui Gu E-mail:grgu@ybu.edu.cn
  • Supported by:

    Project supported by the National Natural Science Foundation of China (Grant Nos. 51272224 and 11164031).

摘要:

Copper (Cu)-doped ZrO2 (CZO) films with different Cu content (0 at.%~8.07 at.%) are successfully deposited on Si (100) substrates by direct current (DC) and radio frequency (RF) magnetron co-sputtering. The influences of Cu content on structural, morphological, optical and electrical properties of CZO films are discussed in detail. The CZO films exhibit ZrO2 monocline (111) preferred orientation, which indicates that Cu atoms are doped in ZrO2 host lattice. The crystallite size estimated form x-ray diffraction (XRD) increases by Cu doping, which accords with the result observed from the scanning electron microscope (SEM). The electrical resistivity decreases from 2.63 Ω.cm to 1.48 Ω·cm with Cu doping content increasing, which indicates that the conductivity of CZO film is improved. However, the visible light transmittances decrease slightly by Cu doping and the optical band gap values decrease from 4.64 eV to 4.48 eV for CZO films.

关键词: Cu-doped ZrO2 films, magnetron co-sputtering, resistivity, transmittance

Abstract:

Copper (Cu)-doped ZrO2 (CZO) films with different Cu content (0 at.%~8.07 at.%) are successfully deposited on Si (100) substrates by direct current (DC) and radio frequency (RF) magnetron co-sputtering. The influences of Cu content on structural, morphological, optical and electrical properties of CZO films are discussed in detail. The CZO films exhibit ZrO2 monocline (111) preferred orientation, which indicates that Cu atoms are doped in ZrO2 host lattice. The crystallite size estimated form x-ray diffraction (XRD) increases by Cu doping, which accords with the result observed from the scanning electron microscope (SEM). The electrical resistivity decreases from 2.63 Ω.cm to 1.48 Ω·cm with Cu doping content increasing, which indicates that the conductivity of CZO film is improved. However, the visible light transmittances decrease slightly by Cu doping and the optical band gap values decrease from 4.64 eV to 4.48 eV for CZO films.

Key words: Cu-doped ZrO2 films, magnetron co-sputtering, resistivity, transmittance

中图分类号:  (Nucleation and growth)

  • 68.55.A-
73.61.-r (Electrical properties of specific thin films) 78.66.-w (Optical properties of specific thin films) 81.15.Cd (Deposition by sputtering)