中国物理B ›› 1999, Vol. 8 ›› Issue (9): 664-669.doi: 10.1088/1004-423X/8/9/005
迟明军, 窦硕星, 叶佩弦
Chi Ming-jun (迟明军), Dou Shuo-xing (窦硕星), Ye Pei-xian (叶佩弦)
摘要: Intensity dependence of the total effective trap density Neff is studied theoretically for the two-centre and the three-charge-state photorefractive crystals. The results show that Neff always increases with increasing intensity in three-charge-state crystals, whereas it has more complicated behaviors in two-centre crystals. When SDγT/STγD is small, Neff increases and tends to saturate with increasing intensity for both type-A and type-B two-centre crystals. When SDγT/STγD is large, Neff increases to a maximum and then decreases a little for type-A crystals and decreases greatly for type-B crystals. The different intensity dependences of Neff in the two types of crystals come from their different level structures.
中图分类号: (Other nonlinear optical materials; photorefractive and semiconductor materials)