中国物理B ›› 1995, Vol. 4 ›› Issue (9): 698-704.doi: 10.1088/1004-423X/4/9/008
• CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES • 上一篇 下一篇
陈俊芳, 任兆杏, 丁振峰
CHEN JUN-FANG (陈俊芳), REN ZHAO-XING (任兆杏), DING ZHEN-FENG (丁振峰)
摘要: The Si3N4 thin films have been manufactured by electron cyclotron resonance plasma enhanced chemical vapour deposition technology on the KBr and (111) monocrystal Si sub-strates, The infrared optical properties of the Si3N4 film have been studied by analysing its IR spectrum. The results show that the Si3N4 film can be used as an antireflexion and an-tireflectiug film of Si surface, The H content of Si3N4 thin film has been estimated from the infrared absorption area. It is obtained that the H content of the Si3N4 film deposited on the KBr substrate is lower than that deposited on Si substrate, and it derceases with increasing deposition temperature. The Raman spectra of the Si3N4 film deposited at 360℃ has also been measured.
中图分类号: (Nucleation and growth)