[1] Baierhofer D, Thomas B, Staiger F, Marchetti B, Foerster C and Erlbacher T 2022 Materials Science in Semiconductor Processing 140 106414 [2] Wang H, Yu J, Hu G, Peng Y, Xie X, Hu X, Chen X and Xu X 2021 Materials 14 5890 [3] Augustine G, Balakrishna V and Brandt C 2000 J. Cryst. Growth 211 339 [4] Cooper J A 1997 Physica Status Solidi a-Applied Research 162 305 [5] Jenny J, Skowronski M, Mitchel W, Hobgood H, Glass R, Augustine G and Hopkins R 1995 J. Appl. Phys. 78 3839 [6] Siergiej R, Clarke R, Sriram S, Agarwal A, Bojko R, Morse A, Balakrishna V, MacMillan M, Burk A and Brandt C 1999 Mat. Sci. Eng. B-Solid 61 9 [7] Zolper J 2005 Emerging silicon carbide power electronics components APEC 2005: Twentieth Annual IEEE Applied Power Electronics Conference and Exposition, VOLS 1-3 Annual IEEE Applied Power Electronics Conference and Exposition (APEC) (IEEE; Power Sources Manufacturers Assoc; IEEE PELS; IEEE Ind Applicat Soc) pp. 11-17 [8] Bhatnagar M, Mclarty P and Baliga B 1992 IEEE Electron Device Lett. 13 501 [9] Ning L, Hu X, Xu X, Chen X, Wang Y, Jiang S and Li J 2008 Journal of Applied Crystallography 41 939 [10] Dadgar A, Hums C, Diez A, Blaesing J and Krost A 2006 J. Cryst. Growth 297 279 [11] Wu Y F, Saxler A, Moore M, Smith R P, Sheppard S, Chavarkar PM, Wisleder T, Mishra U K and Parikh P 2004 IEEE Electron Device Letters 25 117 [12] Wang X and Yoshikawa A 2004 Molecular beam epitaxy growth of GaN, AlN and InN Progress in Crystal Growth and Characterization of Materials Vol. 48-49 pp. 42-103 [13] Frank F C 1951 Acta Crystallographica 4 497 [14] Presser V, Loges A and Nickel K G 2008 Philosophical Magazine 88 1639 [15] Vetter WM and Dudley M 2006 Philosophical Magazine 86 1209 [16] Ouisse T, Chaussende D and Auvray L 2010 Journal of Applied Crystallography 43 122 [17] Le Thi Mai H, Ouisse T and Chaussende D 2012 J. Cryst. Growth 354 202 [18] Hu X, Xu X, Li X, Jiang S, Li J, Wang L, Wang J and Jiang M 2006 J. Cryst. Growth 292 192 [19] Koopmans B, Santos P V and Cardona M 1998 Physica Status Solidi a-Applied Research 170 307 [20] Koopmans B, Richards B, Santos P, Eberl K and Cardona M 1996 Appl. Phys. Lett. 69 782 [21] Huang W, Liu Y, Zhu L, Zheng X, Li Y, Wu Q, Wang Y, Wang X and Chen Y 2016 Opt. Express 24 15059 [22] Chen Y H, Ye X L, Wang J Z, Wang Z G and Yang Z 2002 Phys. Rev. B 66 195321 [23] Aspnes D E 1985 Journal of Vacuum Science & Technology B 3 1498 [24] Chen Y H, Ye X L, Xu B, Wang Z G and Yang Z 2006 Appl. Phys. Lett. 89 051903 [25] Tang C G, Chen Y H, Xu B, Ye X L and Wang Z G 2009 J. Appl. Phys. 105 103108 [26] Zhang WF, Qin Z Y and Yang Z 2005 J. Appl. Phys. 97 074314 [27] Lastras-Martinez L F, del Pozo-Zamudio O, Herrera-Jasso R, Ulloa-Castillo N A, Balderas-Navarro R E, Ortega Gallegos J and Lastras-Martinez A 2012 Physica Status Solidi B-Basic Solid State Physics 249 1119 [28] Lastras-Martinez L F, Castro-Garcia R, Balderas-Navarro R E and Lastras-Martinez A 2009 Appl. Opt. 48 5713 [29] Gao H S, Liu Y, Zhang H Y, Wu S J, Jiang C Y, Yu J L, Zhu L P, Li Y, Huang W and Chen Y H 2014 Appl. Phys. Lett. 104 053106 [30] Lu L, Gao Z Y, Shen B, Xu F J, Huang S, Miao Z L, Hao Y, Yang Z J, Zhang G Y, Zhang X P, Xu J and Yu D P 2008 J. Appl. Phys. 104 123525 [31] Lu L, Gao Z Y, Shen B, Xu F J, Huang S, Miao Z L, Hao Y, Yang Z J, Zhang G Y, Zhang X P, Xu J and Yu D P 2008 J. Appl. Phys. 104 123525 [32] Ge C Z, Hsu C C and Ming N B 1994 J. Cryst. Growth 142 133 [33] Shin Y J, Kim W J, Kim H Y and Bahng W 2013 Dislocation analysis of 4H-and 6H-SiC single crystals using micro-Raman spectroscopy (Materials Science Forum vol. 740-742) pp. 481-484 [34] Matsuoka D, Yamamoto H, Nishino S, Hasuike N, Kisoda K and Harima H 2009 Raman Scattering Study of Stress Distribution around Dislocation in SiC (Materials Science Forum vol. 600-603) pp. 337-340 [35] Gmeinwieser N and Schwarz U T 2007 Phys. Rev. B 75 245213 |