中国物理B ›› 2017, Vol. 26 ›› Issue (2): 27105-027105.doi: 10.1088/1674-1056/26/2/027105

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

On the reverse leakage current of Schottky contacts on free-standing GaN at high reverse biases

Yong Lei(雷勇), Jing Su(苏静), Hong-Yan Wu(吴红艳), Cui-Hong Yang(杨翠红), Wei-Feng Rao(饶伟锋)   

  1. Department of Materials Physics, School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology, Nanjing 210044, China
  • 收稿日期:2016-08-23 修回日期:2016-11-01 出版日期:2017-02-05 发布日期:2017-02-05
  • 通讯作者: Yong Lei E-mail:leiyong@nuist.edu.cn

On the reverse leakage current of Schottky contacts on free-standing GaN at high reverse biases

Yong Lei(雷勇), Jing Su(苏静), Hong-Yan Wu(吴红艳), Cui-Hong Yang(杨翠红), Wei-Feng Rao(饶伟锋)   

  1. Department of Materials Physics, School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology, Nanjing 210044, China
  • Received:2016-08-23 Revised:2016-11-01 Online:2017-02-05 Published:2017-02-05
  • Contact: Yong Lei E-mail:leiyong@nuist.edu.cn

摘要: In this work, a dislocation-related tunneling leakage current model is developed to explain the temperature-dependent reverse current-voltage (I-V-T) characteristics of a Schottky barrier diode fabricated on free-standing GaN substrate for reverse-bias voltages up to -150 V. The model suggests that the reverse leakage current is dominated by the direct tunneling of electrons from Schottky contact metal into a continuum of states associated with conductive dislocations in GaN epilayer. A reverse leakage current ideality factor, which originates from the scattering effect at metal/GaN interface, is introduced into the model. Good agreement between the experimental data and the simulated I-V curves is obtained.

关键词: homoepitaxial GaN, Schottky contact, leakage current, tunneling, dislocations, ideality factor

Abstract: In this work, a dislocation-related tunneling leakage current model is developed to explain the temperature-dependent reverse current-voltage (I-V-T) characteristics of a Schottky barrier diode fabricated on free-standing GaN substrate for reverse-bias voltages up to -150 V. The model suggests that the reverse leakage current is dominated by the direct tunneling of electrons from Schottky contact metal into a continuum of states associated with conductive dislocations in GaN epilayer. A reverse leakage current ideality factor, which originates from the scattering effect at metal/GaN interface, is introduced into the model. Good agreement between the experimental data and the simulated I-V curves is obtained.

Key words: homoepitaxial GaN, Schottky contact, leakage current, tunneling, dislocations, ideality factor

中图分类号:  (III-V semiconductors)

  • 71.55.Eq
72.10.-d (Theory of electronic transport; scattering mechanisms) 73.50.-h (Electronic transport phenomena in thin films)